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llms.txt · MCP 가이드개인정보처리방침 · 이용약관 · 지원v1.8.0
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Ethyl diazoacetate → HCID 12425355, 화합물

HRID 601498
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HRID 601498 반응식
[Sn](Cl)Cl.[N+](=[CH:6][C:7]([O:9][CH2:10][CH3:11])=[O:8])=[N-].[O:12]=[CH:13][CH2:14][CH2:15][O:16][C:17](=[O:19])[CH3:18]>C(Cl)Cl>[CH2:10]([O:9][C:7](=[O:8])[CH2:6][C:13](=[O:12])[CH2:14][CH2:15][O:16][C:17](=[O:19])[CH3:18])[CH3:11]
참가 물질실험 절차후처리출처 및 근거반응 노트

참가 물질

5

반응물 3

HCID 12192Ethyl diazoacetateHCID 24479Stannous ChlorideHCID 877003-Oxopropyl acetate

생성물 1

HCID 12425355HCID 12425355, 화합물수율 31.2%

시약·촉매·용매 1

HCID 6344Dichloromethane용매

실험 절차

Charge a round-bottom flask with tin(II) chloride (16.6 g, 0.088 mol), purge with nitrogen, and add dichloroethane (300 mL) by cannula. Add ethyl diazoacetate (92 mL, 0.88 mol) by cannula and stir 10 min. Add a solution of acetic acid 3-oxo-propyl ester (0.44 mol) in CH2Cl2 (600 mL) slowly by cannula over 1 h, then stir the reaction in a 50° C. oil bath for 3 h. Concentrate under vacuum, add saturated aqueous NaHCO3 and remove the organic phase. Extract the aqueous portion with EtOAc (2×). Wash the combined organic portions with brine, dry over MgSO4, filter through Celite®, and concentrate under vacuum. Purify by flash chromatography on silica gel, eluting with a gradient of EtOAc/hexane 8%-25% to give the title compound (27.8 g, 31%), exact mass 202.08, mass spectrum (ES) 225.1 (M+Na). 1H NMR (CDCl3): δ 4.34 (t, J=6.1 Hz, 2H), 4.20 (q, J=7.1 Hz, 2H), 3.46 (s, 2H), 2.89 (t, J=6.1 Hz, 2H), 2.03 (s, 3H), 1.28 (t, J=7.1 Hz, 3H).

후처리

  1. custompurge with nitrogen
  2. additionadd dichloroethane (300 mL) by cannula
  3. customthe reaction in a 50° C. oil bath for 3 h
  4. concentrationConcentrate under vacuum
  5. additionadd saturated aqueous NaHCO3
  6. customremove the organic phase
  7. extractionExtract the aqueous portion with EtOAc (2×)
  8. washWash the combined organic portions with brine
  9. dry with materialdry over MgSO4
  10. filtrationfilter through Celite®
  11. concentrationconcentrate under vacuum
  12. customPurify by flash chromatography on silica gel
  13. washeluting with a gradient of EtOAc/hexane 8%-25%

출처 및 근거

ORD 기록
ord-70aac20204094b1cab8e841ca2346fa0
출처 데이터셋
uspto-grants-2011_03
DOI
10.6084/m9.figshare.5104873.v1
특허 번호
US07902356B2

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