4-Toluenesulfonyl chloride → HCID 86732633, 화합물

HRID 626392노트

반응식

HRID 626392 반응식
[O:1]1[CH2:4][CH2:3][C@@H:2]1[CH2:5][CH2:6][OH:7].[S:8](Cl)([C:11]1[CH:17]=[CH:16][C:14]([CH3:15])=[CH:13][CH:12]=1)(=[O:10])=[O:9]>CN(C1C=CN=CC=1)C.C(Cl)Cl>[CH3:15][C:14]1[CH:16]=[CH:17][C:11]([S:8]([O:7][CH2:6][CH2:5][C@H:2]2[CH2:3][CH2:4][O:1]2)(=[O:10])=[O:9])=[CH:12][CH:13]=1

참가 물질

5

반응물 2

HCID 73974-Toluenesulfonyl chlorideHCID 89304729HCID 89304729, 화합물

생성물 1

HCID 86732633HCID 86732633, 화합물

시약·촉매·용매 2

HCID 142844-(Dimethylamino)pyridine촉매HCID 6344Dichloromethane용매

실험 절차

The mixture of (S)-2-(oxetan-2-yl)ethanol (408 mg, 4 mmol), TsCl (1.15 g, 6 mmol), TEA (0.85 g, 6 mmol) and DMAP (92 mg, 0.8 mmol) in DCM (20 mL) was stirred at RT for 18 h. Then the mixture was concentrated, the residue was dissolved into EtOAc (15 mL), washed with sat. NaHCO3 aqueous solution, water and brine, then the EtOAc layers was dried with Na2SO4, then the solvent was removed under the reduced pressure. The crude product was purified with Combiflash (PE/EtOAc=5/1, silica gel) to give the titled compound.

후처리

  1. concentrationThen the mixture was concentrated
  2. dissolutionthe residue was dissolved into EtOAc (15 mL)
  3. washwashed with sat. NaHCO3 aqueous solution, water and brine
  4. dry with materialthe EtOAc layers was dried with Na2SO4
  5. customthe solvent was removed under the reduced pressure
  6. customThe crude product was purified with Combiflash (PE/EtOAc=5/1, silica gel)

출처 및 근거

ORD 기록
ord-3fc4b1bbecee437bafd54cb3c481c398
출처 데이터셋
uspto-grants-2016_04
특허 번호
US09309227B2

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