Acetylene → 1-Ethyl-N,N,N',N',N'',N''-hexamethylsilanetriamine

반응식

C#C.[CH:3]([Si:5]([N:12]([CH3:14])[CH3:13])([N:9]([CH3:11])[CH3:10])[N:6]([CH3:8])[CH3:7])=[CH2:4]>>[CH2:3]([Si:5]([N:9]([CH3:10])[CH3:11])([N:6]([CH3:8])[CH3:7])[N:12]([CH3:13])[CH3:14])[CH3:4]

참가 물질

반응물 2

HCID 6326Acetylene

HCID 13548100Vinyltris(dimethylamino)silane

생성물 1

HCID 2072571-Ethyl-N,N,N',N',N'',N''-hexamethylsilanetriamine수율 85%

반응 조건

온도: 240 °C

실험 절차

The reaction was carried out as in Example 3; however, the acetylene pressure was increased to 150 psig and the reaction temperature was maintained at 240° C. Vinyltris(dimethylamino)silane was the single major product at a yield of 85% theoretical. Ethyltris(dimethylamino)silane and 1,2-bis(trisdimethylamino)silylethane were also formed, each in approximately a 2 to 3% yield. Vinyltris(dimethylamino)silane was also formed in approximately 10% yield.