반응식
[SiH:1]([Cl:4])([CH3:3])[CH3:2].[SiH:5]([CH2:10][CH3:11])([CH2:8][CH3:9])[CH2:6][CH3:7].[CH2:12]([Cl:15])[CH:13]=[CH2:14]>>[Si:1]([CH2:14][CH2:13][CH2:12][Cl:15])([CH3:3])([CH3:2])[Cl:4].[Si:5]([CH2:14][CH2:13][CH2:12][Cl:15])([CH2:10][CH3:11])([CH2:8][CH3:9])[CH2:6][CH3:7]참가 물질
5
실험 절차
In a 100 ml apparatus, there were combined 7.1 g (0.075 mol) of Me2SiHCl, 8.7 g (0.075 mol) of Et3SiH and 5.7 g (0.075 mol) of allyl chloride. Pt catalyst solution was added (0.05 ml) at 34° C. Gentle heating caused a smooth exothermic reaction to 92° over 36 min. Vacuum distillation yielded 42.5% of Me2SiClCH2CH2CH2Cl and 4.8% of Et3SiCH2CH2CH2Cl. This example shows that Et3SiH at the equimolar level is an effective promoter for the reaction between Me2SiHCl and allyl chloride.
후처리
- additionPt catalyst solution was added (0.05 ml) at 34° C
- temperatureGentle heating
- customa smooth exothermic reaction to 92° over 36 min
- distillationVacuum distillation
출처 및 근거
- ORD 기록
- ord-ea010ac8c17a469998fda743e4cb84e6
- 출처 데이터셋
- uspto-grants-1986_09
- 특허 번호
- US04614812
연결된 노트
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