반응식
Cl.[CH3:2][O:3][C:4]1[C:14]([O:15][CH3:16])=[CH:13][C:7]2[CH2:8][CH2:9][NH:10][CH2:11][CH2:12][C:6]=2[CH:5]=1.C(N(CC)CC)C.[C:24](Cl)(=[O:27])[CH:25]=[CH2:26]>ClCCl>[C:24]([N:10]1[CH2:11][CH2:12][C:6]2[CH:5]=[C:4]([O:3][CH3:2])[C:14]([O:15][CH3:16])=[CH:13][C:7]=2[CH2:8][CH2:9]1)(=[O:27])[CH:25]=[CH2:26]참가 물질
반응 조건
- 온도
- 0 °C
실험 절차
At ambient temperature, 70 g (287.2 mmol) of the product obtained in Step 2 are dissolved in 1200 mL of dichloromethane, and then 100 mL (718 mmol/2.5 eq.) of triethylamine are added all at once. The mixture is brought to 0° C. and a solution of 25.8 mL (315.9 mmol/1.1 eq.) of acryloyl chloride in 270 mL of dichloromethane is poured in dropwise, maintaining the temperature at about 0° C. After 2 hours at 0° C., the mixture is stirred at ambient temperature overnight. Washing with 750 mL of water, 750 mL of 1N hydrochloric acid and 750 mL of water and then drying over magnesium sulphate are then carried out. After filtration and evaporation, the residue is chromatographed over 3.2 kg of silica (eluant: dichloromethane/ethanol: 95/5), followed by recrystallisation from isopropanol. After filtration over a frit and drying in vacuo at 50° C., the desired product is obtained.
후처리
- customis brought to 0° C.
- washWashing with 750 mL of water, 750 mL of 1N hydrochloric acid and 750 mL of water
- dry with materialdrying over magnesium sulphate
- filtrationAfter filtration and evaporation
- customthe residue is chromatographed over 3.2 kg of silica (eluant: dichloromethane/ethanol: 95/5)
- customfollowed by recrystallisation from isopropanol
- filtrationAfter filtration over a frit
- customdrying in vacuo at 50° C.
출처 및 근거
- ORD 기록
- ord-01fa4a3c5f0240519da7d7926605189f
- 출처 데이터셋
- uspto-grants-2011_12
- 특허 번호
- US08076325B2
연결된 노트
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