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Hydrochloric Acid → HCID 15615501, 화합물

HRID 704614
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HRID 704614 반응식
[CH:1]([NH:3][C:4]1[CH:9]=[CH:8][CH:7]=[CH:6][CH:5]=1)=O.[Cl:10][C:11]1[CH:16]=[C:15]([O:17][CH3:18])[N:14]=C(S(C)(=O)=O)[N:12]=1.Cl>O1CCCC1.O>[NH:3]([C:1]1[N:12]=[C:11]([Cl:10])[CH:16]=[C:15]([O:17][CH3:18])[N:14]=1)[C:4]1[CH:9]=[CH:8][CH:7]=[CH:6][CH:5]=1
참가 물질실험 절차후처리출처 및 근거반응 노트

참가 물질

6

반응물 3

HCID 313Hydrochloric AcidHCID 7671FormanilideHCID 137292254-Chloro-2-(methanesulfonyl)-6-methoxypyrimidine

생성물 1

HCID 15615501HCID 15615501, 화합물수율 87%

시약·촉매·용매 2

HCID 962Water용매HCID 8028Tetrahydrofuran용매

실험 절차

1.8 g of formanilide was dissolved in 50 ml of tetrahydrofuran, and 0.4 g of sodium hydride from which the oily matter had been removed beforehand with n-hexane was slowly added to the resulting solution at 10° to 20° C. while cooling with ice water. To the suspension thus obtained was added 3 3 g of 4-chloro-2-methanesulfonyl-6-methoxypyrimidine, and the mixture was stirred for 1 hour at room temperature. Then, 15 ml of 4N hydrochloric acid was added, and reaction was effected for 1 hour under reflux. The reaction liquid was poured in water, extracted with ether, and the ether layer was washed with water, dried over magnesium sulfate, and then the ether was stripped by concentration The residual crystals were recrystallized from n-hexane, and 4.0 g of 2-anilino-4-chloro-6-methoxypyrimidine was obtained (yield 87%). Melting point: 101°-103° C.

후처리

  1. custom0.4 g of sodium hydride from which the oily matter had been removed beforehand with n-hexane
  2. additionwas slowly added to the resulting solution at 10° to 20° C.
  3. temperaturewhile cooling with ice water
  4. customTo the suspension thus obtained
  5. customreaction
  6. waitwas effected for 1 hour
  7. temperatureunder reflux
  8. customThe reaction liquid
  9. extractionextracted with ether
  10. washthe ether layer was washed with water
  11. dry with materialdried over magnesium sulfate
  12. concentrationthe ether was stripped by concentration The residual crystals
  13. customwere recrystallized from n-hexane

출처 및 근거

ORD 기록
ord-f8c83e859494465d99a524c2effe22a5
출처 데이터셋
uspto-grants-1991_01
DOI
10.6084/m9.figshare.5104873.v1
특허 번호
US04988704

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