Triethylamine → HCID 69659652, 화합물

HRID 722744노트

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HRID 722744 반응식
[C:1]1([S:7]([N:10]2[CH2:35][CH:14]3[CH2:15][CH2:16][CH2:17][CH2:18][CH:19]([NH:22][C:23]([C:25]4[C:34]5[C:29](=[CH:30][CH:31]=[CH:32][CH:33]=5)[CH:28]=[CH:27][N:26]=4)=[O:24])[C:20](=[O:21])[N:13]3[CH:12]([C:36](O)=[O:37])[CH2:11]2)(=[O:9])=[O:8])[CH:6]=[CH:5][CH:4]=[CH:3][CH:2]=1.CCN=C=NCCCN(C)C.Cl.C1C=CC2N(O)N=NC=2C=1.[NH2:61][CH:62]([CH2:77][C:78]([O:80][C:81]([CH3:84])([CH3:83])[CH3:82])=[O:79])[C:63](=[O:76])[CH2:64][O:65][C:66](=[O:75])[C:67]1[C:72]([CH3:73])=[CH:71][CH:70]=[CH:69][C:68]=1[CH3:74].C(N(CC)CC)C>ClCCl>[C:1]1([S:7]([N:10]2[CH2:35][CH:14]3[CH2:15][CH2:16][CH2:17][CH2:18][CH:19]([NH:22][C:23]([C:25]4[C:34]5[C:29](=[CH:30][CH:31]=[CH:32][CH:33]=5)[CH:28]=[CH:27][N:26]=4)=[O:24])[C:20](=[O:21])[N:13]3[CH:12]([C:36]([NH:61][CH:62]([CH2:77][C:78]([O:80][C:81]([CH3:84])([CH3:83])[CH3:82])=[O:79])[C:63](=[O:76])[CH2:64][O:65][C:66](=[O:75])[C:67]3[C:72]([CH3:73])=[CH:71][CH:70]=[CH:69][C:68]=3[CH3:74])=[O:37])[CH2:11]2)(=[O:8])=[O:9])[CH:2]=[CH:3][CH:4]=[CH:5][CH:6]=1

참가 물질

7

반응물 5

HCID 8471TriethylamineHCID 757711-HydroxybenzotriazoleHCID 27239391,3-Propanediamine, N'-(ethylcarbonimidoyl)-N,N-dimethyl-, monohydrochlorideHCID 21882356HCID 21882356, 화합물HCID 235714112,6-Dimethyl-benzoic acid 3-amino-4-tert-butoxycarbonyl-2-oxo-butyl ester

생성물 1

HCID 69659652HCID 69659652, 화합물

시약·촉매·용매 1

HCID 6344Dichloromethane용매

실험 절차

To a solution of 2-benzenesulfonyl-6-[(isoquinoline-1-carbonyl)-amino]-5-oxo-decahydro-2,4a-diaza-benzocyclooctene-4-carboxylic acid, 111, (124 mg, 0.23 mmol) in dichloromethane is added EDCl (191 mg, 1 mmol), HOBt (135 mg, 1 mmol), 2,6-dimethyl-benzoic acid 3-amino-4-tert-butoxycarbonyl-2-oxo-butyl ester (200 mg, 0.62 mmol), and triethylamine (0.15 mL, 1 mmol). After consumption of the starting material, the reaction is diluted with EtOAc and washed with water, 1N HCl, saturated NaHCO3, and brine. The organic layer is concentrated in vacuo and the crude residue obtained is used directly in the next step without purification.

후처리

  1. customAfter consumption of the starting material
  2. additionthe reaction is diluted with EtOAc
  3. washwashed with water, 1N HCl, saturated NaHCO3, and brine
  4. concentrationThe organic layer is concentrated in vacuo

출처 및 근거

ORD 기록
ord-44bc560f9f624ba8809bd0a49f80d73c
출처 데이터셋
uspto-grants-2006_11
특허 번호
US07138395B2

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