Methacrylic Acid → Methacrylic acid hydroxypropyl methacrylate

HRID 747812

반응식

HRID 747812 반응식
C1COCC1.[C:6]([OH:11])(=[O:10])[C:7]([CH3:9])=[CH2:8].[C:12]([O:17][CH2:18][CH2:19][CH2:20][OH:21])(=[O:16])[C:13]([CH3:15])=[CH2:14]>C(C(OC(CC)(CC)C)(CC)C)C.CC(N=NC(C#N)(C)C)(C#N)C>[C:6]([OH:11])(=[O:10])[C:7]([CH3:9])=[CH2:8].[C:12]([O:17][CH2:18][CH2:19][CH2:20][OH:21])(=[O:16])[C:13]([CH3:15])=[CH2:14]

참가 물질

6

반응물 3

HCID 4093Methacrylic AcidHCID 8028TetrahydrofuranHCID 176943-Hydroxypropyl methacrylate

생성물 1

HCID 86602182Methacrylic acid hydroxypropyl methacrylate수율 582.3%

시약·촉매·용매 2

HCID 6547Azobisisobutyronitrile촉매HCID 12430074Diethylethylether용매

실험 절차

To 20 g of THF were added 9 g of methacrylic acid, 1 g of hydroxypropyl methacrylate, and 0.1 g of AIBN. The resulting mixture was reacted at 67° C. for 3 hours. After reaction, the resulting solution was dropped in diethylethyl ether, thereby obtaining 9.3 g of a photoresist polymer of Formula (IVd).

후처리

  1. customThe resulting mixture was reacted at 67° C. for 3 hours
  2. customAfter reaction

출처 및 근거

ORD 기록
ord-a4dcbc86eb9c458dae976a088d9d0c1d
출처 데이터셋
uspto-grants-2008_07
특허 번호
US07399570B2

연결된 노트

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