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Acrylic Acid → Acrylic acid hydroxyethyl acrylate methyl acrylate

HRID 747814
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인쇄 미리보기

반응식

HRID 747814 반응식
C1COCC1.[C:6]([OH:10])(=[O:9])[CH:7]=[CH2:8].[C:11]([O:15][CH2:16][CH2:17][OH:18])(=[O:14])[CH:12]=[CH2:13].[C:19]([O:23][CH3:24])(=[O:22])[CH:20]=[CH2:21]>C(C(OC(CC)(CC)C)(CC)C)C.CC(N=NC(C#N)(C)C)(C#N)C>[C:6]([OH:10])(=[O:9])[CH:7]=[CH2:8].[C:11]([O:15][CH2:16][CH2:17][OH:18])(=[O:14])[CH:12]=[CH2:13].[C:19]([O:23][CH3:24])(=[O:22])[CH:20]=[CH2:21]
참가 물질실험 절차후처리출처 및 근거반응 노트

참가 물질

7

반응물 4

HCID 6581Acrylic AcidHCID 7294Methyl AcrylateHCID 8028TetrahydrofuranHCID 131652-Hydroxyethyl acrylate

생성물 1

HCID 86602184Acrylic acid hydroxyethyl acrylate methyl acrylate수율 608.9%

시약·촉매·용매 2

HCID 6547Azobisisobutyronitrile촉매
이 페이지에서참가 물질실험 절차후처리출처 및 근거반응 노트
HCID 12430074
Diethylethylether
용매

실험 절차

To 20 g of THF were added 8 g of acrylic acid, 1.5 g of hydroxyethyl acrylate, 0.5 g of methyl acrylate, and 0.1 g of AIBN. The resulting mixture was reacted at 67° C. for 3 hours. After reaction, the resulting solution was dropped in diethylethyl ether, thereby obtaining 9.7 g of a photoresist polymer of Formula (Vb).

후처리

  1. customThe resulting mixture was reacted at 67° C. for 3 hours
  2. customAfter reaction

출처 및 근거

ORD 기록
ord-cf6bc5806680455ebc38f9d6055f8c22
출처 데이터셋
uspto-grants-2008_07
DOI
10.6084/m9.figshare.5104873.v1
특허 번호
US07399570B2

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