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Acrylic Acid → Acrylic acid hydroxyethyl acrylate propyl acrylate

HRID 747815
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인쇄 미리보기

반응식

HRID 747815 반응식
C1C[O:4]CC1.[C:6]([OH:10])(=[O:9])[CH:7]=[CH2:8].[C:11]([O:15][CH2:16][CH2:17][OH:18])(=[O:14])[CH:12]=[CH2:13].[CH2:19]([C:21]([O:25][C:26](CC)([CH2:28][CH3:29])C)(CC)C)[CH3:20]>C(OCCC)(=O)C=C.CC(N=NC(C#N)(C)C)(C#N)C>[C:6]([OH:10])(=[O:9])[CH:7]=[CH2:8].[C:11]([O:15][CH2:16][CH2:17][OH:18])(=[O:14])[CH:12]=[CH2:13].[C:21]([O:25][CH2:26][CH2:28][CH3:29])(=[O:4])[CH:19]=[CH2:20]
참가 물질실험 절차후처리출처 및 근거반응 노트

참가 물질

7

반응물 4

HCID 6581Acrylic AcidHCID 8028TetrahydrofuranHCID 131652-Hydroxyethyl acrylateHCID 12430074Diethylethylether

생성물 1

HCID 86602185Acrylic acid hydroxyethyl acrylate propyl acrylate

시약·촉매·용매 2

HCID 6547Azobisisobutyronitrile촉매
HCID 13550
n-Propyl acrylate
촉매

실험 절차

To 20 g of THF were added 8 g of acrylic acid, 1.5 g of hydroxyethyl acrylate, 0.1 g of propyl acrylate, and 0.1 g of AIBN. The resulting mixture was reacted at 67° C. for 3 hours. After reaction, the resulting solution was dropped in diethylethyl ether, thereby obtaining 9.7 g of a photoresist polymer of Formula (Vc).

후처리

  1. customThe resulting mixture was reacted at 67° C. for 3 hours
  2. customAfter reaction

출처 및 근거

ORD 기록
ord-18e1e802009541b9b6f6bfffeace82ca
출처 데이터셋
uspto-grants-2008_07
DOI
10.6084/m9.figshare.5104873.v1
특허 번호
US07399570B2

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