Hydrochloric Acid → HCID 10909234, 화합물

HRID 844428

반응식

HRID 844428 반응식
[CH3:1][O:2][C:3]1[CH:8]=[C:7]([O:9][CH3:10])[CH:6]=[CH:5][C:4]=1[C:11](=O)[CH3:12].[CH2:14]1COCC1.C[Li].Cl>CCOCC>[C:11]([C:4]1[CH:5]=[CH:6][C:7]([O:9][CH3:10])=[CH:8][C:3]=1[O:2][CH3:1])([CH3:12])=[CH2:14]

참가 물질

6

반응물 4

HCID 313Hydrochloric AcidHCID 8028TetrahydrofuranHCID 700161-(2,4-Dimethoxyphenyl)ethanoneHCID 178418348HCID 178418348, 화합물

생성물 1

HCID 10909234HCID 10909234, 화합물

시약·촉매·용매 1

HCID 3283Diethyl Ether용매2회

반응 조건

온도
0 °C

실험 절차

10.57 g of 1-(2,4-dimethoxyphenyl)ethanone are dissolved in 100 ml of ether and 50 ml of THF under nitrogen. 55 ml of 1.6M methyllithium in ether are added at −50° C. and the mixture is left stirring for 2 hours between −60° C. and −40° C. and then for 30 minutes between −40° C. and 0° C. and for 3 hours at RT. It is cooled to 0° C. and 70 ml of 2N HCl are added. After separation of the phases by settling, the aqueous phase is extracted with ether and the organic phase is then dried over Na2SO4. This solution is concentrated and the residue is then taken up in 150 ml of THF and 75 ml of 2N HCl are added. After stirring for 4 hours at RT, 100 ml of water are added and this mixture is then extracted with ether. The organic phase is washed with Na2CO3, with water and then dried over Na2SO4 and concentrated. The residue is chromatographed on silica, eluting with a DCM/pentane mixture (70/30 and then 60/40). 5 g of the expected compound are obtained in the form of an oil.

후처리

  1. waitthe mixture is left
  2. waitfor 30 minutes between −40° C. and 0° C.
  3. waitfor 3 hours at RT
  4. customAfter separation of the phases
  5. extractionthe aqueous phase is extracted with ether
  6. dry with materialthe organic phase is then dried over Na2SO4
  7. concentrationThis solution is concentrated
  8. addition75 ml of 2N HCl are added
  9. stirringAfter stirring for 4 hours at RT
  10. addition100 ml of water are added
  11. extractionthis mixture is then extracted with ether
  12. washThe organic phase is washed with Na2CO3, with water
  13. dry with materialdried over Na2SO4
  14. concentrationconcentrated
  15. customThe residue is chromatographed on silica
  16. washeluting with a DCM/pentane mixture (70/30

출처 및 근거

ORD 기록
ord-dea23ab0f05b45c381c98dbd3a82f019
출처 데이터셋
uspto-grants-2002_04
특허 번호
US06380230B1

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