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Hydrochloric Acid → HCID 86594505, 화합물

HRID 858199
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HRID 858199 반응식
[CH2:1]1[S:7][C:5](=[O:6])[NH:4][C:2]1=[O:3].C([Li])CCC.[F:13][C:14]1[CH:19]=[CH:18][C:17]([C:20]2[O:21][C:22]([CH3:36])=[C:23]([CH2:25][O:26][C@@H:27]3[CH2:32][CH2:31][CH2:30][C@H:29](CC=O)[CH2:28]3)[N:24]=2)=[CH:16][CH:15]=1.Cl.[O:38]1CC[CH2:40][CH2:39]1>CCCCCC>[F:13][C:14]1[CH:15]=[CH:16][C:17]([C:20]2[O:21][C:22]([CH3:36])=[C:23]([CH2:25][O:26][C@@H:27]3[CH2:32][CH2:31][CH2:30][C@H:29]([O:38][CH2:39][CH:40]=[C:1]4[S:7][C:5](=[O:6])[NH:4][C:2]4=[O:3])[CH2:28]3)[N:24]=2)=[CH:18][CH:19]=1
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참가 물질

7

반응물 5

HCID 313Hydrochloric AcidHCID 5437ThiazolidinedioneHCID 8028Tetrahydrofuran2회HCID 86594504[cis-3-[2-(4-Fluorophenyl)-5-methyloxazol-4-ylmethoxy]cyclohexyl]acetaldehydeHCID 178418339Butyllithium

생성물 1

HCID 86594505HCID 86594505, 화합물

시약·촉매·용매 1

HCID 8058Hexane용매

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온도
-78 °C

실험 절차

66 mg of thiazolidinedione are dissolved in 10 ml of tetrahydrofuran and, at −78° C., 0.11 ml of a 2.7 M solution of n-butyllithium in n-hexane is added. The mixture is stirred at −78° C. for 30 minutes, and 150 mg of [cis-3-[2-(4-fluorophenyl)-5-methyloxazol-4-ylmethoxy]cyclohexyl]acetaldehyde, dissolved in 5 ml of tetrahydrofuran, are then added. After 30 minutes of stirring at −78° C., the mixture is allowed to warm to room temperature. 5 ml of 1N hydrochloric acid are added, and the mixture is extracted three times with in each case 20 ml of ethyl acetate. The combined organic phases are dried over magnesium sulfate and the solvent is then removed under reduced pressure. The residue is purified by RP-HPLC. This gives 184 mg of 5-(2-{cis-3-[2-(4-fluorophenyl)-5-methyloxazol-4-ylmethoxy]cyclohexyl-oxy}ethylidene)thiazolidine-2,4-dione as a white solid. C22H23FN2O5S (446.01), MS (ESI): 447 (M+H+).

후처리

  1. additionare then added
  2. stirringAfter 30 minutes of stirring at −78° C.
  3. temperatureto warm to room temperature
  4. extractionthe mixture is extracted three times with in each case 20 ml of ethyl acetate
  5. dry with materialThe combined organic phases are dried over magnesium sulfate
  6. customthe solvent is then removed under reduced pressure
  7. customThe residue is purified by RP-HPLC

출처 및 근거

ORD 기록
ord-cfc5a095285c4e52a2ca5ff4f72dcb12
출처 데이터셋
uspto-grants-2006_12
DOI
10.6084/m9.figshare.5104873.v1
특허 번호
US07148246B2

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