Formamide → 3-[3-(4,7-Diaza-spiro[2.5]oct-7-yl)-naphthalen-1-yl]-4-(1-methyl-1H-indol-3-yl)-pyrrole-2,5-dione

HRID 900146노트

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HRID 900146 반응식
C(O[C:4](=[O:31])[CH2:5][C:6]1[C:15]2[C:10](=[CH:11][CH:12]=[CH:13][CH:14]=2)[CH:9]=[C:8]([N:16]2[CH2:23][C:20]3([CH2:22][CH2:21]3)[N:19](CC3C=CC=CC=3)[CH2:18][CH2:17]2)[CH:7]=1)C.C(N1CCN(C2[CH:48]=[C:49]([CH2:57][C:58]([NH2:60])=[O:59])[C:50]3[C:55](C=2)=[CH:54][CH:53]=[CH:52][CH:51]=3)CC21CC2)C1C=CC=CC=1.[CH:61]([NH2:63])=O.C[O-].[Na+]>CN(C=O)C.CO>[CH2:21]1[C:20]2([CH2:23][N:16]([C:8]3[CH:7]=[C:6]([C:5]4[C:4](=[O:31])[NH:60][C:58](=[O:59])[C:57]=4[C:49]4[C:50]5[C:55](=[CH:54][CH:53]=[CH:52][CH:51]=5)[N:63]([CH3:61])[CH:48]=4)[C:15]4[C:10]([CH:9]=3)=[CH:11][CH:12]=[CH:13][CH:14]=4)[CH2:17][CH2:18][NH:19]2)[CH2:22]1

참가 물질

6

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온도
105 °C

실험 절차

2-[3-(4-Benzyl-4,7-diaza-spiro[2.5] oct-7-yl)-naphthalen-1-yl]-acetamide [3-(4-Benzyl-4,7-diaza-spiro[2.5] oct-7-yl)-naphthalen-1-yl]-acetic acid ethyl ester (347 mg, 0.84 mmol) and formamide (126 mg, 2.80 mmol) are dissolved under an atmosphere of argon in DMF (1 ml). The solution is heated to 105° C., and NaOMe (155 μL of a 5.4 M solution in MeOH, 45 mg, 0.84 mmol) is added dropwise during 15 minutes. After 30 minutes at 105° C., TLC analysis indicates complete consumption of starting material. The reaction mixture is cooled to RT, diluted with water, and extracted with EtOAc. The EtOAc layers are washed twice with water. Removal of solvent and purification by FCC (EtOAc/MeOH 98:2 to 96:4 to 90:10) yielded the title compound. 1H NMR (CDCl3, 400 MHz) δ 0.71 (ddd, 2H), 0.89 (ddd, 2H), 3.10 (ddd, 2H), 3.16 (s, 2H), 3.31 (ddd, 2H), 3.93 (s, 2H), 3.99 (s, 2H), 3.99 (s, 2H), 5.33 (br, 1H), 5.42 (br, 1H), 7.11 (s, 1H), 7.23 (d, J=2.0, 1H), 7.32 (m, 5H), 7.37 (dd, J=6.7 Hz, 1H), 7.45 (dd, J=6.7 Hz, 1H), 7.73 (d, J=8.9 Hz, 1H), 7.85 (d, J=8.9 Hz, 1H); ES-MS: 386 [M+H]+.

후처리

  1. customconsumption of starting material
  2. temperatureThe reaction mixture is cooled to RT
  3. additiondiluted with water
  4. extractionextracted with EtOAc
  5. washThe EtOAc layers are washed twice with water
  6. customRemoval of solvent and purification by FCC (EtOAc/MeOH 98:2 to 96:4 to 90:10)

출처 및 근거

ORD 기록
ord-39ac8e06d0b0454ab483a6297860538b
출처 데이터셋
uspto-grants-2008_04
특허 번호
US07358253B2

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