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Benzoic Acid → HCID 22558468, 화합물

HRID 984438
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HRID 984438 반응식
[NH2:1][C:2]1[CH:7]=[CH:6][C:5]([CH2:8][C:9]([NH:12][C:13](=[O:30])[C:14]([NH:16][C:17]2[CH:22]=[CH:21][C:20]([C:23]3[O:27][CH:26]=[N:25][CH:24]=3)=[C:19]([O:28][CH3:29])[CH:18]=2)=[O:15])([CH3:11])[CH3:10])=[CH:4][CH:3]=1.[C:31](O)(=[O:38])[C:32]1[CH:37]=[CH:36][CH:35]=[CH:34][CH:33]=1.O.ON1C2C=CC=CC=2N=N1.Cl.CN(C)CCCN=C=NCC.C(N1CCOCC1)C>ClCCl>[C:31]([NH:1][C:2]1[CH:7]=[CH:6][C:5]([CH2:8][C:9]([NH:12][C:13](=[O:30])[C:14]([NH:16][C:17]2[CH:22]=[CH:21][C:20]([C:23]3[O:27][CH:26]=[N:25][CH:24]=3)=[C:19]([O:28][CH3:29])[CH:18]=2)=[O:15])([CH3:10])[CH3:11])=[CH:4][CH:3]=1)(=[O:38])[C:32]1[CH:37]=[CH:36][CH:35]=[CH:34][CH:33]=1
참가 물질실험 절차후처리출처 및 근거반응 노트

참가 물질

7

반응물 5

HCID 243Benzoic AcidHCID 7525EthylmorpholineHCID 27239391,3-Propanediamine, N'-(ethylcarbonimidoyl)-N,N-dimethyl-, monohydrochlorideHCID 27960291-Hydroxybenzotriazole hydrateHCID 22558446HCID 22558446, 화합물

생성물 1

HCID 22558468HCID 22558468, 화합물수율 23.7%

시약·촉매·용매 1

HCID 6344Dichloromethane용매2회

실험 절차

A mixture of 30 mg (0.074 mmol) of N-[2-(4-aminophenyl)-1,1-dimethylethyl]-N′-[3-methoxy-4-(5-oxazolyl)phenyl]oxalamide, 10 mg (0.082 mmol) of benzoic acid, 14 mg (0.092 mmol) of 1-hydroxybenzotriazole hydrate, 21 mg (0.11 mmol) of 1-(3-dimethylaminopropyl)-3-ethylcarbodiimide hydrochloride and 18 mg (0.16 mmol) of N-ethylmorpholine in 2 ml of dichloromethane was stirred at room temperature for 18 hours then diluted with dichloromethane and washed with 2M hydrochloric acid and saturated sodium bicarbonate. The organic phase was dried over magnesium sulphate, evaporated to dryness and the residue chromatographed on silica gel using ethyl acetate/petrol (2:1) for the elution. There was obtained 9 mg of N-[2-(4-benzamidophenyl)-1,1-dimethylethyl]-N′-[3-methoxy-4-(5-oxazolyl)phenyl]oxalamide as a white solid. MS: m/e 513 [M+H]+.

후처리

  1. washwashed with 2M hydrochloric acid and saturated sodium bicarbonate
  2. dry with materialThe organic phase was dried over magnesium sulphate
  3. customevaporated to dryness
  4. customthe residue chromatographed on silica gel
  5. washfor the elution

출처 및 근거

ORD 기록
ord-26237ff15e924065a0148e65979a3cb7
출처 데이터셋
uspto-grants-2005_03
DOI
10.6084/m9.figshare.5104873.v1
특허 번호
US06867299B2

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