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HuagongsheHuagongshe Chemistry Print Report · For research reference only
HRID 1004432Generated: October 30, 2026

Triethoxysilane → HCID 13750416, compound

https://huagongshe.com/reaction/1004432

Reaction equation

Participants

RoleNameHCIDCharge
ReactantTriethoxysilaneHCID 13830—
Reactant1,2-DiethenylbenzeneHCID 66666—
Reactant1,1-Diethenyl-1,3,3,3-tetramethyldisiloxaneHCID 17760531—
SolventTolueneHCID 1140—
ProductHCID 13750416HCID 137504162.8%

Reaction Conditions

Temperature50 °C

Reaction Steps

871 mg Of divinylbenzene and 4.35 g of triethoxysilane were placed in a glass reaction tube and 0.015 ml of a toluene solution of a 0-valent platinum complex of divinyltetramethyldisiloxane (platinum content: 0.2 Wt. %) was added to this mixture. The reaction tube was sealed with Teflon tape and heated for 30 minutes in an oil bath at 50° C. When the tube contents were analyzed by GC-MS following cooling, the conversion rate of divinylbenzene was 56%; bis (2-triethoxysilylethyl) benzene was produced at a yield of 2.8%, (1-triethoxysilylethyl) (2-triethoxysilylethyl) benzene was produced at a yield of 3.7%, and bis (1-triethoxysilylethyl) benzene was produced at a yield of 0.1%. No production of (triethoxysilyl) ethylstyrene was observed.

Provenance & Evidence

DOI10.6084/m9.figshare.5104873.v1
Patent numberUS06048994
Source datasetuspto-grants-2000_04
ORD IDord-26a57ed90ebd4b69be2d04b8d257142c
Source noteuspto-grants-2000_04