Triethoxysilane → HCID 13750416, compound
Reaction equation
[CH:1]([C:3]1[CH:8]=[CH:7][CH:6]=[CH:5][C:4]=1[CH:9]=[CH2:10])=[CH2:2].[CH2:11]([O:13][SiH:14]([O:18][CH2:19][CH3:20])[O:15][CH2:16][CH3:17])[CH3:12].C([Si]([CH:30]=[CH2:31])(C)O[Si](C)(C)C)=C>C1(C)C=CC=CC=1>[CH2:11]([O:13][Si:14]([O:18][CH2:19][CH3:20])([O:15][CH2:16][CH3:17])[CH2:2][CH2:1][C:3]1[CH:8]=[CH:7][CH:6]=[CH:5][C:4]=1[CH2:9][CH2:10][Si:14]([O:18][CH2:30][CH3:31])([O:15][CH2:16][CH3:17])[O:13][CH2:11][CH3:12])[CH3:12]Participants
Reactant 3
Product 1
Reagents, catalysts & solvents 1
Conditions
- Temperature
- 50 °C
Procedure
871 mg Of divinylbenzene and 4.35 g of triethoxysilane were placed in a glass reaction tube and 0.015 ml of a toluene solution of a 0-valent platinum complex of divinyltetramethyldisiloxane (platinum content: 0.2 Wt. %) was added to this mixture. The reaction tube was sealed with Teflon tape and heated for 30 minutes in an oil bath at 50° C. When the tube contents were analyzed by GC-MS following cooling, the conversion rate of divinylbenzene was 56%; bis (2-triethoxysilylethyl) benzene was produced at a yield of 2.8%, (1-triethoxysilylethyl) (2-triethoxysilylethyl) benzene was produced at a yield of 3.7%, and bis (1-triethoxysilylethyl) benzene was produced at a yield of 0.1%. No production of (triethoxysilyl) ethylstyrene was observed.
Workup
- additionwas added to this mixture
- temperaturefollowing cooling
Sources & evidence
- ORD record
- ord-26a57ed90ebd4b69be2d04b8d257142c
- Source dataset
- uspto-grants-2000_04
- Patent number
- US06048994
Reaction notes
Loading…