HuagongsheHuagongshe Chemistry Print Report · For research reference only
HRID 1050632Generated: November 1, 2026
Phenol → Propylene glycol methyl ether acetate
https://huagongshe.com/reaction/1050632
Participants
| Role | Name | HCID | Charge |
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| Reactant | Phenol | HCID 996 | — |
| Reactant | 1-Methoxy-2-propanol | HCID 7900 | — |
| Reactant | Diisopropylcarbodiimide | HCID 12734 | — |
| Reactant | Fluorine | HCID 24524 | — |
| Product | Propylene glycol methyl ether acetate | HCID 7946 | — |
Reaction Steps
To 1.0 g of a commercially available phenol novolac resin (manufactured by Gunei Chemical Industry Co., Ltd.), 0.2 g of an epoxy-based cross-linking agent (manufactured by Tohto Kasei Co., Ltd., trade name: YH434L) and 0.003 g of a surfactant (manufactured by DIC Corporation, product name: MEGAFAC [registered trademark] R-30, composed of a fluorine-based surfactant) were added. The resultant mixture was dissolved in 6.7 g of propylene glycol monomethyl ether and 15.6 g of propylene glycol monomethyl ether acetate to obtain a solution. Subsequently, the solution was filtered using a polyethylene microfilter with a pore diameter of 0.2 μm to prepare a solution of the organic underlayer film forming composition for use in a lithography process with a multilayer film.
Provenance & Evidence
| DOI | 10.6084/m9.figshare.5104873.v1 |
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| Patent number | US09384977B2 |
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| Source dataset | uspto-grants-2016_07 |
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| ORD ID | ord-9157a5d333d54b4cb94e3b8e628a13ba |
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| Source note | uspto-grants-2016_07 |
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