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HuagongsheHuagongshe Chemistry Print Report · For research reference only
HRID 1050632Generated: November 1, 2026

Phenol → Propylene glycol methyl ether acetate

https://huagongshe.com/reaction/1050632

Reaction equation

Participants

RoleNameHCIDCharge
ReactantPhenolHCID 996—
Reactant1-Methoxy-2-propanolHCID 7900—
ReactantDiisopropylcarbodiimideHCID 12734—
ReactantFluorineHCID 24524—
ProductPropylene glycol methyl ether acetateHCID 7946—

Reaction Steps

To 1.0 g of a commercially available phenol novolac resin (manufactured by Gunei Chemical Industry Co., Ltd.), 0.2 g of an epoxy-based cross-linking agent (manufactured by Tohto Kasei Co., Ltd., trade name: YH434L) and 0.003 g of a surfactant (manufactured by DIC Corporation, product name: MEGAFAC [registered trademark] R-30, composed of a fluorine-based surfactant) were added. The resultant mixture was dissolved in 6.7 g of propylene glycol monomethyl ether and 15.6 g of propylene glycol monomethyl ether acetate to obtain a solution. Subsequently, the solution was filtered using a polyethylene microfilter with a pore diameter of 0.2 μm to prepare a solution of the organic underlayer film forming composition for use in a lithography process with a multilayer film.

Provenance & Evidence

DOI10.6084/m9.figshare.5104873.v1
Patent numberUS09384977B2
Source datasetuspto-grants-2016_07
ORD IDord-9157a5d333d54b4cb94e3b8e628a13ba
Source noteuspto-grants-2016_07