Phenol → Propylene glycol methyl ether acetate
Reaction equation
[C:1]1([OH:7])C=CC=C[CH:2]=1.CC(C)N=C=NC(C)C.FF.[CH3:19][O:20][CH2:21][CH:22]([OH:24])[CH3:23]>>[C:1]([O:24][CH:22]([CH3:23])[CH2:21][O:20][CH3:19])(=[O:7])[CH3:2]Participants
Procedure
To 1.0 g of a commercially available phenol novolac resin (manufactured by Gunei Chemical Industry Co., Ltd.), 0.2 g of an epoxy-based cross-linking agent (manufactured by Tohto Kasei Co., Ltd., trade name: YH434L) and 0.003 g of a surfactant (manufactured by DIC Corporation, product name: MEGAFAC [registered trademark] R-30, composed of a fluorine-based surfactant) were added. The resultant mixture was dissolved in 6.7 g of propylene glycol monomethyl ether and 15.6 g of propylene glycol monomethyl ether acetate to obtain a solution. Subsequently, the solution was filtered using a polyethylene microfilter with a pore diameter of 0.2 μm to prepare a solution of the organic underlayer film forming composition for use in a lithography process with a multilayer film.
Workup
- additionwere added
Sources & evidence
- ORD record
- ord-9157a5d333d54b4cb94e3b8e628a13ba
- Source dataset
- uspto-grants-2016_07
- Patent number
- US09384977B2
Reaction notes
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