Toluene → HCID 68855689, compound

HRID 1071691Notes

Reaction equation

HRID 1071691 reaction equation
[CH3:1][O:2][C:3]([C:5]1[C:6]2[CH:7]=[C:8]([C:26]([O:28]C(C)(C)C)=[O:27])[N:9]([CH2:14][C:15]3[CH:19]=[C:18]([C:20]4[S:21][C:22]([Cl:25])=[CH:23][CH:24]=4)[O:17][N:16]=3)[C:10]=2[CH:11]=[CH:12][CH:13]=1)=[O:4].C1(C)C=CC=CC=1>FC(F)(F)C(O)=O>[CH3:1][O:2][C:3]([C:5]1[C:6]2[CH:7]=[C:8]([C:26]([OH:28])=[O:27])[N:9]([CH2:14][C:15]3[CH:19]=[C:18]([C:20]4[S:21][C:22]([Cl:25])=[CH:23][CH:24]=4)[O:17][N:16]=3)[C:10]=2[CH:11]=[CH:12][CH:13]=1)=[O:4]

Participants

4

Reactant 2

HCID 1140TolueneHCID 68855333HCID 68855333, compound

Product 1

HCID 68855689HCID 68855689, compound

Reagents, catalysts & solvents 1

HCID 6422Trifluoroacetic acidSolvent

Procedure

4.1 g 1-[5-(5-Chloro-thiophen-2-yl)-isoxazol-3-ylmethyl]-1H-indole-2,4-dicarboxylic acid 2-tert-butyl ester 4-methyl ester were dissolved in 100 ml trifluoro-acetic acid and stirred for 1 h at RT. Then 100 ml toluene was added and the solvents were removed under reduced pressure. This procedure was repeated three times, then the residue was dried in vacuo.

Workup

  1. customthe solvents were removed under reduced pressure
  2. customthe residue was dried in vacuo

Sources & evidence

ORD record
ord-dd17caa6959b498f823e45d772103aa6
Source dataset
uspto-grants-2005_06
Patent number
US06906084B2

Reaction notes

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