Trifluoroacetic acid → HCID 53685458, compound
Reaction equation
[CH3:1][C:2]([CH3:49])([CH3:48])[C:3](=[O:47])[O:4][CH2:5][O:6][P:7]([CH2:19][C:20]([N:22]1[C@H:30]([C:31]([O:33]C(C2C=CC=CC=2)C2C=CC=CC=2)=[O:32])[CH2:29][C:24]2([S:28][CH2:27][CH2:26][S:25]2)[CH2:23]1)=[O:21])([CH2:9][CH2:10][CH2:11][CH2:12][C:13]1[CH:18]=[CH:17][CH:16]=[CH:15][CH:14]=1)=[O:8].FC(F)(F)C(O)=O>ClCCl>[CH3:1][C:2]([CH3:49])([CH3:48])[C:3](=[O:47])[O:4][CH2:5][O:6][P:7]([CH2:19][C:20]([N:22]1[C@H:30]([C:31]([OH:33])=[O:32])[CH2:29][C:24]2([S:25][CH2:26][CH2:27][S:28]2)[CH2:23]1)=[O:21])([CH2:9][CH2:10][CH2:11][CH2:12][C:13]1[CH:14]=[CH:15][CH:16]=[CH:17][CH:18]=1)=[O:8]Participants
4
Reactant 2
Product 1
Reagents, catalysts & solvents 1
Procedure
(S)-7-[[[(2,2-Dimethyl-1-oxopropoxy)methoxy](4-phenylbutyl)phosphinyl]acetyl]-1,4-dithia-7-azaspiro[4.4]nonane-8-carboxylic acid, diphenylmethyl ester (2.4 g) in dry dichloromethane is treated with 3.0 ml of trifluoroacetic acid under argon at room temperature. After 1 hour, the trifluoroacetic acid and dichloromethane are removed in vacuo and the resulting oil partioned between ethyl acetate and water. The layers are separated and the organic phase is washed with brine, dried (MgSO4) and evaporated. The residue (4.0 g) is chromatographed on 130 g of silica eluting with dichloromethane/acetic acid/methanol (18:1:1) to give (after azeotropic removal of acetic acid with toluene) 1.5 g of the title compound.
Workup
- customthe trifluoroacetic acid and dichloromethane are removed in vacuo
- customThe layers are separated
- washthe organic phase is washed with brine
- dry with materialdried (MgSO4)
- customevaporated
- customThe residue (4.0 g) is chromatographed on 130 g of silica eluting with dichloromethane/acetic acid/methanol (18:1:1)
- customto give
- custom(after azeotropic removal of acetic acid with toluene) 1.5 g of the title compound
Sources & evidence
- ORD record
- ord-8e4ba32667a84981b226da02f28681f3
- Source dataset
- uspto-grants-1982_06
- Patent number
- US04337201
Reaction notes
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