Ethyl vinyl ether → HCID 59202558, compound

HRID 1161620Notes

Reaction equation

HRID 1161620 reaction equation
[F:1][C:2]([F:9])([F:8])[C:3](=[CH2:7])[C:4]([OH:6])=[O:5].[CH:10]([O:12][CH2:13][CH3:14])=[CH2:11]>CCOCC>[F:1][C:2]([F:9])([F:8])[C:3](=[CH2:7])[C:4]([O:6][CH:10]([O:12][CH2:13][CH3:14])[CH3:11])=[O:5]

Participants

4

Reactant 2

HCID 8023Ethyl vinyl etherHCID 5876942-(Trifluoromethyl)acrylic acid

Product 1

HCID 59202558HCID 59202558, compound

Reagents, catalysts & solvents 1

HCID 3283Diethyl EtherSolvent

Procedure

14.0 g of 2-trifluoromethylacrylic acid (2-TFMAA) and 30 g of ethyl vinyl ether were stirred at room temperature under nitrogen and using a DRY ICE condenser. The initial endotherm gave way to a mild exotherm to approximately 33° C. and some outgassing (reflux). The reaction was complete in 15 minutes. Et2O added. Organics were washed with 10% Na2CO3 (containing a small amount of NaOH), saturated NaHCO3 and finally brine followed by drying with MgSO4. Evaporated on rotary evaporator at 30° C. Yield 29.0 g of colorless liquid.

Workup

  1. customThe initial endotherm gave way to a mild exotherm to approximately 33° C.
  2. temperaturesome outgassing (reflux)
  3. washOrganics were washed with 10% Na2CO3 (
  4. additioncontaining a small amount of NaOH), saturated NaHCO3 and finally brine
  5. dry with materialby drying with MgSO4
  6. customEvaporated on rotary evaporator at 30° C

Sources & evidence

ORD record
ord-f1f8521ea6154777a0840f1c9c2a3765
Source dataset
uspto-grants-2010_10
Patent number
US07820369B2

Reaction notes

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