HRID1380162

反应详情

EQUATION

反应方程式

REACTANTS

反应物

HCID23953

Silane

H4Si

HCID87409

Silane, ethenyltris(1-methylethoxy)-

C11H24O3Si

HCID15722916

未命名化合物

PRODUCTS

生成物

HCID74813

Silicic acid (H4SiO4), tetrakis(1-methylethyl) ester

C12H28O4Si

收率 2%

结构：CC(C)O[Si](CC[Si](OC(C)C)(OC(C)C)OC(C)C)(OC(C)C)OC(C)C

HCID21903035

未命名化合物

收率 3%

PROCEDURE

实验过程

The reaction was carried out as in Comparative Example 5 except that the starting silane used was triisopropoxysilane, a secondary alkoxysilane, and the reaction temperature was maintained at 140° C. After three hours the reaction was complete as monitored by GPC. The major product formed was vinyltriisopropoxysilane (95%). 1,2-bis(triisopropoxysilyl)ethane (3%) and tetraisopropoxysilane (2%) by-products were also formed.

WORKUP

后处理

customThe major product formed

来源与证据

来源类型: Open Reaction Database
ORD 记录: ord-65b094fce1df4589851bf7ee2c4dbaf0
来源数据集: uspto-grants-1986_04
DOI: 10.6084/m9.figshare.5104873.v1
专利: US04579965
来源说明: uspto-grants-1986_04

反应 SMILES

[SiH4].[CH:2]([O:5][SiH:6]([O:11][CH:12]([CH3:14])[CH3:13])[O:7][CH:8]([CH3:10])[CH3:9])([CH3:4])[CH3:3].[CH:15]([Si:17]([O:26][CH:27]([CH3:29])[CH3:28])([O:22][CH:23]([CH3:25])[CH3:24])[O:18][CH:19]([CH3:21])[CH3:20])=[CH2:16]>>[CH:8]([O:7][Si:6]([O:5][CH:2]([CH3:4])[CH3:3])([O:11][CH:12]([CH3:14])[CH3:13])[CH2:16][CH2:15][Si:17]([O:18][CH:19]([CH3:20])[CH3:21])([O:22][CH:23]([CH3:25])[CH3:24])[O:26][CH:27]([CH3:28])[CH3:29])([CH3:10])[CH3:9].[CH:8]([O:7][Si:6]([O:18][CH:19]([CH3:21])[CH3:20])([O:5][CH:2]([CH3:4])[CH3:3])[O:11][CH:12]([CH3:14])[CH3:13])([CH3:10])[CH3:9]