Hydrochloric Acid → HCID 68511847, 화합물
반응식
[N:1]1([C:11](=[O:23])[CH2:12][S:13][C:14]2[S:15][C:16]3[CH:21]=[CH:20][N:19]=[CH:18][C:17]=3[N:22]=2)[C:10]2[C:5](=[CH:6][CH:7]=[CH:8][CH:9]=2)[CH2:4][CH2:3][CH2:2]1.[ClH:24]>CCOCC.CCO>[ClH:24].[N:1]1([C:11](=[O:23])[CH2:12][S:13][C:14]2[S:15][C:16]3[CH:21]=[CH:20][N:19]=[CH:18][C:17]=3[N:22]=2)[C:10]2[C:5](=[CH:6][CH:7]=[CH:8][CH:9]=2)[CH2:4][CH2:3][CH2:2]1참가 물질
5
반응 조건
- 온도
- 0 °C
실험 절차
Compound 69 (162 mg, 4.7 mmol) was dissolved in 10 mL of Et2O and 2.5 mL of EtOH, stirred for 10 min, then 0.57 mL of 1M HCl (in Et2O) was added slowly. The precipitation started upon addition of the acid. The reaction mixture was stirred for 1 h at RT, 40 min at 0° C., filtered. The precipitate washed with Et2O and dried under high vacuum over P4O10 overnight, then at 45° C. for 4 h to yield compound 70 (150 mg, 77%): MS: m/z+ 342.1 (M+H)+; Anal. Calcd (found) for C17H16ClN3OS2: C, 54.03 (53.78); H, 4.27 (4.33); N, 11.12 (10.95); Cl, 9.38 (9.15); S, 16.97 (16.68).
후처리
- customThe precipitation
- additionstarted upon addition of the acid
- filtrationfiltered
- washThe precipitate washed with Et2O
- dry with materialdried under high vacuum over P4O10 overnight
출처 및 근거
- ORD 기록
- ord-de419a28b3be46359dd805965f4c6d14
- 출처 데이터셋
- uspto-grants-2014_12
- 특허 번호
- US08916550B2
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