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HuagongsheHuagongshe Chemistry Print Report · For research reference only
HRID 1461626Generated: October 30, 2026

Benzene → HCID 131717132, compound

https://huagongshe.com/reaction/1461626

Reaction equation

Participants

RoleNameHCIDCharge
ReactantBenzeneHCID 241—
ReactantMethyl MethacrylateHCID 6658—
ReactantPentazirinocyclodiphosphathiazeneHCID 72601—
SolventWaterHCID 962—
Solvent1,1,2-TrichloroethaneHCID 6574—
ProductHCID 131717132HCID 131717132—

Reaction Steps

A benzene solution in which SOAZ was dissolved in a concentration of 0.2 mg/ml and a solution obtained by dissolving PMMA (produced by of Polyscience Co.; syndiotactic; molecular weight: 100,000) in a mixed solution of trichloroethane:benzene=1:9 (V/V) in a concentration of 0.2 mg/ml, were appropriately mixed so as to give the desired mixing ratio, and thereafter the resulting mixed solution was spread on pure water of 20° C. in water temperature to form an SOAZ-PMMA mixed monomolecular film on the water surface. After removal of the solvent by evaporation, the surface pressure of the monomolecular film thus formed was raised up to 20 mN/m. While keeping constant the surface pressure, a substrate provided with the lower electrode 2 (Cr/Au), prepared in the same manner as Example 1, was gently put in water at a rate of 5 mm/min in the direction traversing the water surface, and thereafter subsequently gently drawn up at a rate of 5 mm/min, thus building up a two-layer Y-type mixed monomolecular film. Such operations were repeated several times to form a 12-layer mixed built-up film, thus providing the organic insulating layer 3.

Provenance & Evidence

DOI10.6084/m9.figshare.5104873.v1
Patent numberUS05075738
Source datasetuspto-grants-1991_12
ORD IDord-9cfda1cd2c6740b79f63acf31b8b8a26
Source noteuspto-grants-1991_12