HuagongsheHuagongshe Chemistry Print Report · For research reference only
Trifluoroacetic acid → HCID 86698935, compound
Participants
| Role | Name | HCID | Charge |
|---|---|---|---|
| Reactant | Trifluoroacetic acid | HCID 6422 | — |
| Reactant | HCID 86698936 | HCID 86698936 | — |
| Solvent | Dichloromethane | HCID 6344 | — |
| Product | HCID 86698935 | HCID 86698935 | — |
Reaction Steps
To a stirred solution of 3 (160 mg, 0.157 mmol) in anhydrous DCM (2 mL) under nitrogen atmosphere was added TFA (2 mL). The reaction mixture was stirred for 2 hours at room temperature and evaporated to dryness. The residue was redissolved in dry DCM (2 ml) and again treated with TFA (2 mL) for 2 hours. This process was repeated once more. Finally, the reaction mixture was evaporated to dryness and co-evaporated twice with DCM furnishing the deprotected product 4 in quantitative yield.
Provenance & Evidence
| DOI | 10.6084/m9.figshare.5104873.v1 |
|---|---|
| Patent number | US09427482B2 |
| Source dataset | uspto-grants-2016_08 |
| ORD ID | ord-cb9234b744654160b2207c209bf8dbb0 |
| Source note | uspto-grants-2016_08 |