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HuagongsheHuagongshe Chemistry Print Report · For research reference only
HRID 1509371Generated: November 2, 2026

Phosphoric Acid → HCID 117951820, compound

https://huagongshe.com/reaction/1509371

Reaction equation

Participants

RoleNameHCIDCharge
ReactantPhosphoric AcidHCID 1004—
ReactantHCID 131734409HCID 131734409—
SolventWaterHCID 962—
ProductHCID 117951820HCID 117951820—

Reaction Steps

The compound produced in Example 2 [photosensitive material C] (2 g) was added to a mixture of water (40 g) and phosphoric acid (0.5 g), and the resultant mixture was stirred at 20° C. for 5 hours, to thereby remove the acetal protective group. Thereafter, the temperature of the deprotected mixture was adjusted to 10° C. and neutralized with 1 weight % aqueous sodium hydroxide to a pH of 8. The precipitates formed through neutralization were immediately separated through filtration and dried, to thereby yield 1 g of photosensitive material F as a target compound.

Provenance & Evidence

DOI10.6084/m9.figshare.5104873.v1
Patent numberUS09223210B2
Source datasetuspto-grants-2015_12
ORD IDord-b65be25bb86240f584150874b0a3397c
Source noteuspto-grants-2015_12