HuagongsheHuagongshe Chemistry Print Report · For research reference only
Phosphoric Acid → HCID 117951820, compound
Participants
| Role | Name | HCID | Charge |
|---|---|---|---|
| Reactant | Phosphoric Acid | HCID 1004 | — |
| Reactant | HCID 131734409 | HCID 131734409 | — |
| Solvent | Water | HCID 962 | — |
| Product | HCID 117951820 | HCID 117951820 | — |
Reaction Steps
The compound produced in Example 2 [photosensitive material C] (2 g) was added to a mixture of water (40 g) and phosphoric acid (0.5 g), and the resultant mixture was stirred at 20° C. for 5 hours, to thereby remove the acetal protective group. Thereafter, the temperature of the deprotected mixture was adjusted to 10° C. and neutralized with 1 weight % aqueous sodium hydroxide to a pH of 8. The precipitates formed through neutralization were immediately separated through filtration and dried, to thereby yield 1 g of photosensitive material F as a target compound.
Provenance & Evidence
| DOI | 10.6084/m9.figshare.5104873.v1 |
|---|---|
| Patent number | US09223210B2 |
| Source dataset | uspto-grants-2015_12 |
| ORD ID | ord-b65be25bb86240f584150874b0a3397c |
| Source note | uspto-grants-2015_12 |