2-Nitrobenzaldehyde → HCID 19754698, compound
Reaction equation
[Br-].[CH:2]1([P+](C2C=CC=CC=2)(C2C=CC=CC=2)C2C=CC=CC=2)[CH2:7][CH2:6][CH2:5][CH2:4][CH2:3]1.CC(C)([O-])C.[K+].[N+:33]([C:36]1[CH:43]=[CH:42][CH:41]=[CH:40][C:37]=1[CH:38]=O)([O-:35])=[O:34]>C1COCC1>[C:2]1(=[CH:38][C:37]2[CH:40]=[CH:41][CH:42]=[CH:43][C:36]=2[N+:33]([O-:35])=[O:34])[CH2:7][CH2:6][CH2:5][CH2:4][CH2:3]1Participants
5
Reactant 3
Product 1
Reagents, catalysts & solvents 1
Procedure
To a slurry of cyclohexyl triphenylphosphonium bromide (16.6 g) in THF (100 mL) at 24° C. was added potassium t-butoxide (4.38 g). The mixture was stirred for 30 min. o-Nitrobenzaldehyde (3.93 g) in THF (50 mL) was added dropwise below 30° C. and stirred for 30 min. The mixture was then partitioned between EtOAc and ice water. The EtOAc layer was washed well with water, dried (MgSO4) and concentrated in vacuo. The residue was chromatographed on silica gel with 5% EtOAc/hexanes to give 1-(cyclohexylidenemethyl)-2-nitrobenzene.
Workup
- additionwas added dropwise below 30° C.
- customThe mixture was then partitioned between EtOAc and ice water
- washThe EtOAc layer was washed well with water
- dry with materialdried (MgSO4)
- concentrationconcentrated in vacuo
- customThe residue was chromatographed on silica gel with 5% EtOAc/hexanes
Sources & evidence
- ORD record
- ord-0d1748c9c17c4d39ab3ceac48294f29e
- Source dataset
- uspto-grants-1993_06
- Patent number
- US05223526
Reaction notes
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