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HuagongsheHuagongshe Chemistry Print Report · For research reference only
HRID 1595048Generated: October 30, 2026

Trifluoroacetic acid → HCID 21706317, compound

https://huagongshe.com/reaction/1595048

Reaction equation

Participants

RoleNameHCIDCharge
ReactantTrifluoroacetic acidHCID 6422—
ReactantTriethylsilaneHCID 12052—
ReactantAluminium lithium hydrideHCID 21226445—
ReactantHCID 21706337HCID 21706337—
SolventDichloromethaneHCID 6344—
SolventTetrahydrofuranHCID 8028—
ProductHCID 21706317HCID 2170631763%

Reaction Steps

To the product (1 g, 1.94 mmol) of Example 28 dissolved in anhydrous THF (80 mL) was added LAH (0.47 g, 12.4 mmol) at 0-5° C. under nitrogen. The reaction mixture was stirred for 2 hours and quenched with ice-cold NaOH (0.5 M) solution. The organic layer was extracted with ethyl acetate, combined, dried and concentrated in vacuo. To this residue (0.88 g, 1.8 mmol) dissolved in dichloromethane (˜50 mL) was added triethylsilane (1.73 mL, 10.8 mmol) and TFA (0.42 mL, 5.4 mmol). The reaction mixture was stirred for 1.5 hours before it was washed with dilute NaOH solution and brine until neutral. The combined organic layers were dried with Na2SO4 and concentrated. The residue was purified by column chromatography (20% CH3OH in dichloromethane) to yield 0.53 g (63%) of title compound.

Provenance & Evidence

DOI10.6084/m9.figshare.5104873.v1
Patent numberUS06284756B1
Source datasetuspto-grants-2001_09
ORD IDord-23befca2a5ec4464b55a2e9df8cc63c2
Source noteuspto-grants-2001_09