HuagongsheHuagongshe Chemistry Print Report · For research reference only
HRID 1595048Generated: October 30, 2026
Trifluoroacetic acid → HCID 21706317, compound
https://huagongshe.com/reaction/1595048
Participants
| Role | Name | HCID | Charge |
|---|
| Reactant | Trifluoroacetic acid | HCID 6422 | — |
| Reactant | Triethylsilane | HCID 12052 | — |
| Reactant | Aluminium lithium hydride | HCID 21226445 | — |
| Reactant | HCID 21706337 | HCID 21706337 | — |
| Solvent | Dichloromethane | HCID 6344 | — |
| Solvent | Tetrahydrofuran | HCID 8028 | — |
| Product | HCID 21706317 | HCID 21706317 | 63% |
Reaction Steps
To the product (1 g, 1.94 mmol) of Example 28 dissolved in anhydrous THF (80 mL) was added LAH (0.47 g, 12.4 mmol) at 0-5° C. under nitrogen. The reaction mixture was stirred for 2 hours and quenched with ice-cold NaOH (0.5 M) solution. The organic layer was extracted with ethyl acetate, combined, dried and concentrated in vacuo. To this residue (0.88 g, 1.8 mmol) dissolved in dichloromethane (˜50 mL) was added triethylsilane (1.73 mL, 10.8 mmol) and TFA (0.42 mL, 5.4 mmol). The reaction mixture was stirred for 1.5 hours before it was washed with dilute NaOH solution and brine until neutral. The combined organic layers were dried with Na2SO4 and concentrated. The residue was purified by column chromatography (20% CH3OH in dichloromethane) to yield 0.53 g (63%) of title compound.
Provenance & Evidence
| DOI | 10.6084/m9.figshare.5104873.v1 |
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| Patent number | US06284756B1 |
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| Source dataset | uspto-grants-2001_09 |
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| ORD ID | ord-23befca2a5ec4464b55a2e9df8cc63c2 |
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| Source note | uspto-grants-2001_09 |
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