Chlorodi(isopropyl)silane → HCID 100925553, compound

Temperature

40 °C

Diisopropylchlorosilane (2.11 g, 14.0 mmol) was dissolved in anhydrous THF (12 mL) and treated with 1.2 equivalents of allylmagnesium chloride (8.4 mL, 2.0 M in THF, 16.8 mmol). The reaction was heated to 40° C. for 4 hours, then cooled and quenched with water (10 mL) and dilute sulfuric acid (10 mL), and extracted into pentane (2×50 mL). The organic layers were combined and washed with water (5×10 mL), then dried over MgSO4, filtered, and concentrated via rotary evaporator (carefully, product is volatile) to yield crude allyldiisopropylsilane (1.9 g). No further purification was performed.

1. temperaturecooled
2. customquenched with water (10 mL) and dilute sulfuric acid (10 mL)
3. extractionextracted into pentane (2×50 mL)
4. washwashed with water (5×10 mL)
5. dry with materialdried over MgSO4
6. filtrationfiltered
7. concentrationconcentrated via rotary evaporator (carefully, product

ORD record

ord-4d8cf0376f8841c38f730e10a800e4f9

Source dataset

uspto-grants-2014_07

DOI

10.6084/m9.figshare.5104873.v1

Patent number

US08779179B2