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HuagongsheHuagongshe Chemistry Print Report · For research reference only
HRID 1753271Generated: October 30, 2026

Oxygen → N,N-diethyl-m-toluamide

https://huagongshe.com/reaction/1753271

Reaction equation

Participants

RoleNameHCIDCharge
ReactantOxygenHCID 977—
ReactantTolueneHCID 1140—
ReactantCornforth reagentHCID 2724130—
ProductN,N-diethyl-m-toluamideHCID 4284—

Reaction Steps

Glass coverslips (Thomas Scientific 6661 F52, 22×22 mm No. 1) were cleaned using an O2 plasma cleaner (Harrick PDC-32G) for 20 minutes at 100 mTorr. The DETA (United Chemical Technologies Inc. T2910KG) films were formed by the reaction of the cleaned glass surface with a 0.1% (v/v) mixture of the organosilane in freshly distilled toluene (Fisher T2904). The DETA coated coverslips were then heated to approximately QQ 100° C., rinsed with toluene, reheated to approximately 100° C., and then oven dried [28]. Surfaces were characterized by contact angle measurements using an optical contact angle goniometer (KSV Instruments, Cam 200) and by X-ray photoelectron spectroscopy (XPS) (Kratos Axis 165). XPS survey scans, as well as high-resolution N1s and C1s scans utilizing monochromatic Al Kα excitation were obtained [28].

Provenance & Evidence

DOI10.6084/m9.figshare.5104873.v1
Patent numberUS09163216B1
Source datasetuspto-grants-2015_10
ORD IDord-d9d0176895344090bdfe920e1c46d403
Source noteuspto-grants-2015_10