Trifluoroacetic acid → HCID 22065959, compound

HRID 1768346Notes

Reaction equation

HRID 1768346 reaction equation
[F:1][C:2]1[CH:3]=[C:4]2[C:8](=[CH:9][CH:10]=1)[NH:7][C:6]([CH2:11][N:12]1[CH2:18][CH2:17][CH2:16][N:15](C(OC(C)(C)C)=O)[CH2:14][CH2:13]1)=[CH:5]2.C(O)(C(F)(F)F)=O>C(Cl)Cl>[N:12]1([CH2:11][C:6]2[NH:7][C:8]3[C:4]([CH:5]=2)=[CH:3][C:2]([F:1])=[CH:10][CH:9]=3)[CH2:18][CH2:17][CH2:16][NH:15][CH2:14][CH2:13]1

Participants

4

Reactant 2

HCID 6422Trifluoroacetic acidHCID 22065985HCID 22065985, compound

Product 1

HCID 22065959HCID 22065959, compound

Reagents, catalysts & solvents 1

HCID 6344DichloromethaneSolvent

Procedure

The product from Example 11B (0.48 g, 1.40 mmol) in CH2Cl2 (20 mL) was treated with TFA (20 mL) and stirred for 1 hour. The mixture was concentrated under reduced pressure and the residue was purified by flash chromatography (10% MeOH/CH2Cl2/1% NH4OH) to provide the title compound. 1H NMR (CD3OD, 300 MHz) δ 1.85–1.98(m, 4H), 2.58–2.68(m, 2H), 3.45–3.57 (m, 4H), 3.67(s, 2H), 6.25(s, 1H), 6.75–6.90(m, 1H), 7.10–7.25(m, 2H); MS (DCI/NH3) m/z 248 (M+H)+.

Workup

  1. concentrationThe mixture was concentrated under reduced pressure
  2. customthe residue was purified by flash chromatography (10% MeOH/CH2Cl2/1% NH4OH)

Sources & evidence

ORD record
ord-89d299458da64ec8aa27249ecf727909
Source dataset
uspto-grants-2007_06
Patent number
US07235661B2

Reaction notes

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