Trifluoroacetic acid → HCID 25205738, compound

HRID 1804822Notes

Reaction equation

HRID 1804822 reaction equation
[F:1][C:2]1[CH:22]=[CH:21][C:20]([CH2:23][N:24]2[C:33]3[C:28](=[CH:29][CH:30]=[CH:31][CH:32]=3)[C:27](=[O:34])[CH:26]=[CH:25]2)=[CH:19][C:3]=1[C:4]([N:6]1[CH2:11][CH2:10][N:9](C(OC(C)(C)C)=O)[CH2:8][CH2:7]1)=[O:5].C(O)(C(F)(F)F)=O>C(Cl)Cl>[F:1][C:2]1[CH:22]=[CH:21][C:20]([CH2:23][N:24]2[C:33]3[C:28](=[CH:29][CH:30]=[CH:31][CH:32]=3)[C:27](=[O:34])[CH:26]=[CH:25]2)=[CH:19][C:3]=1[C:4]([N:6]1[CH2:7][CH2:8][NH:9][CH2:10][CH2:11]1)=[O:5]

Participants

4

Reactant 2

HCID 6422Trifluoroacetic acidHCID 67334241HCID 67334241, compound

Product 1

HCID 25205738HCID 25205738, compound

Reagents, catalysts & solvents 1

HCID 6344DichloromethaneSolvent

Procedure

B1 from step 1 was stirred in a 1:1 mixture of DCM and TFA (0.1M) for 30 min. The solvents were removed under reduced pressure and the residue was dissolved in MeOH. The solution was applied on a SCX cation exchange resin, the resin was washed with H2O and MeOH and the product was eluted with ammonia in MeOH (2N). The solvents were removed under reduced pressure to a afford the title compound as a beige solid.

Workup

  1. customThe solvents were removed under reduced pressure
  2. dissolutionthe residue was dissolved in MeOH
  3. washthe resin was washed with H2O and MeOH
  4. washthe product was eluted with ammonia in MeOH (2N)
  5. customThe solvents were removed under reduced pressure to

Sources & evidence

ORD record
ord-a3fb4914597642bb84ecb94a44a9cd13
Source dataset
uspto-grants-2013_01
Patent number
US08354413B2

Reaction notes

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