HCID 68489029, compound → HCID 68491417, compound
Reaction equation
C(OC(=O)[NH:7][CH:8]([C:13](=[O:26])[NH:14][CH:15]([CH:20]1[CH2:25][CH2:24][CH2:23][CH2:22][CH2:21]1)[C:16](=[O:19])[NH:17][CH3:18])[C:9]([CH3:12])([CH3:11])[CH3:10])(C)(C)C>ClCCl.FC(F)(F)C(O)=O>[NH2:7][CH:8]([C:9]([CH3:12])([CH3:11])[CH3:10])[C:13]([NH:14][CH:15]([CH:20]1[CH2:21][CH2:22][CH2:23][CH2:24][CH2:25]1)[C:16](=[O:19])[NH:17][CH3:18])=[O:26]Participants
3
Reactant 1
Product 1
Reagents, catalysts & solvents 1
Procedure
Compound 20 was kept in dichloromethane-trifluoroacetic acid 2:1 for 1 h at rt and concentrated to dryness. The residue was dried in a vacuum for 16 hrs. Reversed phase C18 HPLC showed >95% purity M+H+283.1.
Workup
- customfor 1 h
- customat rt
- concentrationconcentrated to dryness
- customThe residue was dried in a vacuum for 16 hrs
Sources & evidence
- ORD record
- ord-12b96bb212384a99b53aff70d0acaa1b
- Source dataset
- uspto-grants-2009_10
- Patent number
- US07608590B2
Reaction notes
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