HCID 15895124, compound → HCID 178435737, compound
Reaction equation
C(OC([NH:8][C:9]([NH:32]C(OC(C)(C)C)=O)=[N:10][CH2:11][C:12]1[CH:16]=[C:15]([CH:17]([C:19]2[CH:24]=[CH:23][C:22]([C:25]3[CH:30]=[CH:29][CH:28]=[CH:27][CH:26]=3)=[C:21]([F:31])[CH:20]=2)[CH3:18])[O:14][N:13]=1)=O)(C)(C)C>FC(F)(F)C(O)=O>[F:31][C:21]1[CH:20]=[C:19]([CH:17]([C:15]2[O:14][N:13]=[C:12]([CH2:11][NH:10][C:9]([NH2:32])=[NH:8])[CH:16]=2)[CH3:18])[CH:24]=[CH:23][C:22]=1[C:25]1[CH:30]=[CH:29][CH:28]=[CH:27][CH:26]=1Participants
3
Reactant 1
Product 1
Reagents, catalysts & solvents 1
Procedure
The compound (1.24 g) obtained in Example 10 was dissolved in trifluoroacetic acid (10 ml), and the solution was stirred at room temperature for 2 hours and then the solvent was distilled off under reduced pressure. The residue was dissolved in ethyl acetate and the resulting solution was neutralized with a 1N aqueous sodium hydroxide solution, after which the organic layer was separated, washed with water, dried and then concentrated under reduced pressure. The residue was purified by a silica gel column chromatography to obtain the desired compound (562 mg).
Workup
- distillationthe solvent was distilled off under reduced pressure
- dissolutionThe residue was dissolved in ethyl acetate
- customafter which the organic layer was separated
- washwashed with water
- customdried
- concentrationconcentrated under reduced pressure
- customThe residue was purified by a silica gel column chromatography
Sources & evidence
- ORD record
- ord-1caee5a9f8c64c7aaf06be6b0b586e6f
- Source dataset
- uspto-grants-2000_08
- Patent number
- US06100260
Reaction notes
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