反应详情

Compound 47A (0.126 g, 0.25 mmol) was dissolved in THF and TBAF (1M in THF, 0.50 mL, 0.50 mmol) solution was added. The resulting mixture was stirred for 18 h. The mixture was concentrated, diluted with NaCl saturated solution and extracted with DCM. The organic layer was dried over anhydrous Na2SO4 and concentrated. The residue was purified by Prep LC/MS using 5-95% gradient of acetonitrile/water with 0.1% formic acid. The resulting material was purified by ion exchange chromatography using a Strata SPE SCX column to remove t-butyl dimethylsilane impurity. Compound 514 (0.070 g, 70%) was isolated as a free base. 1H-NMR (400 MHz, CDCl3) δ: 1.07 (s, 9H), 1.85 (m, 3H), 2.37 (s, 3H), 2.53 (m, 2H), 2.80 (d, 3H), 2.95 (m, 2H), 3.82 (t, 2H), 4.06 (m, 2H), 4.29 (m, 3H), 5.93 (m, 1H), 6.34 (d, 1H), 6.73 (m, 1H), 7.86 (m, 1H); LCMS (+ESI) m/z 392.2 [M+H]+.

1. concentrationThe mixture was concentrated
2. additiondiluted with NaCl saturated solution
3. extractionextracted with DCM
4. dry with materialThe organic layer was dried over anhydrous Na2SO4
5. concentrationconcentrated
6. customThe residue was purified by Prep LC/MS
7. customThe resulting material was purified by ion exchange chromatography
8. customto remove t-butyl dimethylsilane impurity