Oxolane--water (1/1) → HCID 66856356, compound

HRID 2037433Notes

Reaction equation

HRID 2037433 reaction equation
[CH2:1]([C:4]1([C:27]2[CH:32]=[CH:31][C:30]([F:33])=[CH:29][CH:28]=2)[O:9][C:8](=[O:10])[N:7]([C@H:11]([C:13]2[CH:18]=[CH:17][C:16]([C:19]3[CH:24]=[CH:23][C:22]([F:25])=[CH:21][C:20]=3[F:26])=[CH:15][CH:14]=2)[CH3:12])[CH2:6][CH2:5]1)[CH:2]=C.C1C[O:37]CC1.O>CCOC(C)=O.O=[Os](=O)(=O)=O>[F:26][C:20]1[CH:21]=[C:22]([F:25])[CH:23]=[CH:24][C:19]=1[C:16]1[CH:17]=[CH:18][C:13]([C@@H:11]([N:7]2[CH2:6][CH2:5][C:4]([C:27]3[CH:32]=[CH:31][C:30]([F:33])=[CH:29][CH:28]=3)([CH2:1][CH2:2][OH:37])[O:9][C:8]2=[O:10])[CH3:12])=[CH:14][CH:15]=1

Participants

5

Procedure

To a solution of 6-allyl-3-((S)-1-(2′,4′-difluorobiphenyl-4-yl)ethyl)-6-(4-fluorophenyl)-1,3-oxazinan-2-one (obtained as described in Example 111) in THF-H2O (1:1, 20 mL) were added NaIO4 (1.0148 g, 4.74 mmol, 5 equiv) and OsO4 (2.5 wt. % solution in t-BuOH, 0.1708 g, 0.0167 mmol, 0.018 equiv), and the mixture was stirred at rt for 2 h. The mixture was diluted with EtOAc, dried over Na2SO4, and concentrated under reduced pressure. The residue was dissolved in MeOH (10 mL) and NaBH4 (0.200 g) was added. After the mixture was stirred for 1 h at rt, acetone was added. The solvents were removed in vacuo, the residue was treated with saturated brine, extracted with CH2Cl2, and dried over Na2SO4. After the solvents were evaporated, the residue was purified by chromatography on silica gel eluted with hexanes/EtOAc to afford the two diastereomers of 3-((S)-1-(2′,4′-difluorobiphenyl-4-yl)ethyl)-6-(4-fluorophenyl)-6-(2-hydroxyethyl)-1,3-oxazinan-2-one.

Workup

  1. dry with materialdried over Na2SO4
  2. concentrationconcentrated under reduced pressure
  3. dissolutionThe residue was dissolved in MeOH (10 mL)
  4. additionNaBH4 (0.200 g) was added
  5. stirringAfter the mixture was stirred for 1 h at rt
  6. additionacetone was added
  7. customThe solvents were removed in vacuo
  8. additionthe residue was treated with saturated brine
  9. extractionextracted with CH2Cl2
  10. dry with materialdried over Na2SO4
  11. customAfter the solvents were evaporated
  12. customthe residue was purified by chromatography on silica gel
  13. washeluted with hexanes/EtOAc

Sources & evidence

ORD record
ord-4c1d66a3054146fb9988259532b0a741
Source dataset
uspto-grants-2013_11
Patent number
US08575156B2

Reaction notes

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