Back
HuagongsheHuagongshe Chemistry Print Report · For research reference only
HRID 2045756Generated: October 30, 2026

HCID 21910299, compound → HCID 131731054, compound

https://huagongshe.com/reaction/2045756

Reaction equation

Participants

RoleNameHCIDCharge
ReactantHCID 21910299HCID 21910299—
CatalystCopperHCID 23978—
Solvent1-DecanethiolHCID 8917—
ProductHCID 131731054HCID 131731054—

Reaction Steps

The SAM functionalized SERS active surfaces were prepared in two steps, as shown in FIG. 26. First, AgFON surfaces were fabricated by drop-coating 10 μl of 390 nm diameter nanosphere solution onto clean copper substrates, and then depositing a 200-nm-thick Ag film onto the nanosphere mask. The AgFON substrates were then incubated in 1 mM decanethiol (DT) for 45 minutes and subsequently transferred to 1 mM mercaptohexanol (MH) solution for at least 12 hours to form a mixed DT/MH SAM. The substrates were kept in 1 mM MH in ethanol prior to surgically implantation.

Provenance & Evidence

DOI10.6084/m9.figshare.5104873.v1
Patent numberUS08592226B2
Source datasetuspto-grants-2013_11
ORD IDord-31596570010e495890aa289b88ad459e
Source noteuspto-grants-2013_11