HuagongsheHuagongshe Chemistry Print Report · For research reference only
HCID 21910299, compound → HCID 131731054, compound
Participants
| Role | Name | HCID | Charge |
|---|---|---|---|
| Reactant | HCID 21910299 | HCID 21910299 | — |
| Catalyst | Copper | HCID 23978 | — |
| Solvent | 1-Decanethiol | HCID 8917 | — |
| Product | HCID 131731054 | HCID 131731054 | — |
Reaction Steps
The SAM functionalized SERS active surfaces were prepared in two steps, as shown in FIG. 26. First, AgFON surfaces were fabricated by drop-coating 10 μl of 390 nm diameter nanosphere solution onto clean copper substrates, and then depositing a 200-nm-thick Ag film onto the nanosphere mask. The AgFON substrates were then incubated in 1 mM decanethiol (DT) for 45 minutes and subsequently transferred to 1 mM mercaptohexanol (MH) solution for at least 12 hours to form a mixed DT/MH SAM. The substrates were kept in 1 mM MH in ethanol prior to surgically implantation.
Provenance & Evidence
| DOI | 10.6084/m9.figshare.5104873.v1 |
|---|---|
| Patent number | US08592226B2 |
| Source dataset | uspto-grants-2013_11 |
| ORD ID | ord-31596570010e495890aa289b88ad459e |
| Source note | uspto-grants-2013_11 |