Sulfuric Acid → HCID 22709185, compound

HRID 2051931Notes

Reaction equation

HRID 2051931 reaction equation
[CH3:1][CH2:2][CH2:3][CH2:4][CH2:5][CH2:6][CH2:7][CH:8]=[CH2:9].[C:10](#[N:13])[CH:11]=[CH2:12].C1C2NC3C(=CC=CC=3)SC=2C=CC=1.S(=O)(=O)(O)[OH:29]>>[CH2:9]([NH:13][C:10](=[O:29])[CH:11]=[CH2:12])[CH2:8][CH2:7][CH2:6][CH2:5][CH2:4][CH2:3][CH2:2][CH3:1]

Participants

5

Reactant 4

HCID 1118Sulfuric AcidHCID 7108PhenothiazineHCID 7855AcrylonitrileHCID 312851-Nonene

Product 1

HCID 22709185HCID 22709185, compound

Procedure

To a mixture of propylene trimer (504 parts by weight (pbw)) acrylonitrile (232 pbw), and phenothiazine (0.4 pbw) is added 85% sulfuric acid (510 pbw) at 40°-45° C. over a period of one hour. The reaction is held at this temperature for an additional four hours, cooled and the upper layer (unreacted olefin, 95 pbw) separated. The lower aqueous layer is decanted into ice water (1500 pbw) and toluene (250 pbw) added. The upper organic layer is washed twice with 100 pbw portions of water, then with 20% sodium carbonate solution (35 pbw) dried over anhydrous sodium sulfate (40 pbw) and evaporated under vacuum to give the title product as a liquid residue (575 pbw).

Workup

  1. temperaturecooled
  2. customthe upper layer (unreacted olefin, 95 pbw) separated
  3. customThe lower aqueous layer is decanted into ice water (1500 pbw) and toluene (250 pbw)
  4. additionadded
  5. washThe upper organic layer is washed twice with 100 pbw portions of water
  6. dry with materialwith 20% sodium carbonate solution (35 pbw) dried over anhydrous sodium sulfate (40 pbw)
  7. customevaporated under vacuum

Sources & evidence

ORD record
ord-577df9bb72fa450fbf59735640cc14ed
Source dataset
uspto-grants-1980_01
Patent number
US04182790

Reaction notes

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