Trifluoroacetic acid → HCID 25109291, compound
Reaction equation
[NH2:1][C:2]1[N:11]=[C:10]([N:12]2[CH2:17][CH2:16][N:15](C(OC(C)(C)C)=O)[CH2:14][CH2:13]2)[C:9]2[CH2:8][CH2:7][C:6]3[O:25][C@H:26]4[CH2:31][CH2:30][CH2:29][CH2:28][C@H:27]4[C:5]=3[C:4]=2[N:3]=1.FC(F)(F)C(O)=O>>[N:12]1([C:10]2[C:9]3[CH2:8][CH2:7][C:6]4[O:25][C@H:26]5[CH2:31][CH2:30][CH2:29][CH2:28][C@H:27]5[C:5]=4[C:4]=3[N:3]=[C:2]([NH2:1])[N:11]=2)[CH2:17][CH2:16][NH:15][CH2:14][CH2:13]1Participants
Procedure
The product from Example 3A (179 mg, 0.419 mmol) was cooled with an ice bath and treated with trifluoroacetic acid (6.5 mL, 84 mmol) for 1 minute, then concentrated under reduced pressure for about 2 minutes to remove excess trifluoroacetic acid. The residue was cooled with an ice bath, taken up in dichloromethane (50 mL) and basified with sodium hydroxide (10%). The organic layer was separated, dried with magnesium sulfate, and concentrated under reduced pressure. The resulting residue was chromatographed on a silica gel column eluting with ammonium hydroxide/methanol/dichloromethane (0.8/8/92) to provide the title product in enantiomerically enriched form: 1H NMR (CDCl3) δ 1.20-1.31 (m, 2H), 1.44-1.53 (m, 1H), 1.53-1.61 (m, 2H), 1.71-1.85 (m, 1H), 2.08-2.16 (m, 2H), 2.42 (t, 2H), 2.67-2.78 (m, 2H), 2.93-3.00 (m, 4H), 3.03-3.10 (m, 1H), 3.10-3.16 (m, 4H), 4.62-4.69 (m, 3H); MS (DCl/NH3) m/z 328 (M+H)+; [α]58920−106° (c 0.0038, methanol).
Workup
- concentrationconcentrated under reduced pressure for about 2 minutes
- customto remove excess trifluoroacetic acid
- temperatureThe residue was cooled with an ice bath
- customThe organic layer was separated
- dry with materialdried with magnesium sulfate
- concentrationconcentrated under reduced pressure
- customThe resulting residue was chromatographed on a silica gel column
- washeluting with ammonium hydroxide/methanol/dichloromethane (0.8/8/92)
Sources & evidence
- ORD record
- ord-be628f71eb7e4b32ae20ffa006d839de
- Source dataset
- uspto-grants-2012_10
- Patent number
- US08278311B2
Reaction notes
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