Trifluoroacetic acid → HCID 44231735, compound
Reaction equation
[NH2:1][C:2]1[N:11]=[C:10]([N:12]2[CH2:16][CH2:15][C@@H:14]([N:17](C)[C:18](=O)OC(C)(C)C)[CH2:13]2)[C:9]2[CH2:8][CH2:7][CH2:6][C:5]3([CH2:29][CH2:28][CH2:27][CH2:26]3)[C:4]=2[N:3]=1.FC(F)(F)C(O)=O>C(Cl)Cl>[CH3:18][NH:17][C@@H:14]1[CH2:15][CH2:16][N:12]([C:10]2[C:9]3[CH2:8][CH2:7][CH2:6][C:5]4([CH2:29][CH2:28][CH2:27][CH2:26]4)[C:4]=3[N:3]=[C:2]([NH2:1])[N:11]=2)[CH2:13]1Participants
4
Reactant 2
Product 1
Reagents, catalysts & solvents 1
Procedure
A solution of Example 1G (38 mg, 0.09 mmol) in CH2Cl2 (2 mL) was treated with trifluoroacetic acid (0.1 mL) at ambient temperature, and the reaction was stirred for 16 hours. The mixture was diluted with CH2Cl2 (20 mL) and washed with 1N NaOH and water. The organic layer was dried (MgSO4) and concentrated under reduced pressure, and the resulting residue was chromatographed on silica gel (0.8:7.2:92 NH4OH/MeOH/CH2Cl2, eluant) to provide the title product. 1H NMR (300 MHz, CD3OD) δ 3.55-3.78 (m, 3 H), 3.37-3.44 (m, 1 H), 3.22 (t, 1 H), 2.57-2.65 (m, 2 H), 2.38-2.41 (m, 3 H), 2.02-2.17 (m, 3 H), 1.51-1.91 (m, 11 H). MS (DCI+) m/z 302 (M+H).
Workup
- washwashed with 1N NaOH and water
- dry with materialThe organic layer was dried (MgSO4)
- concentrationconcentrated under reduced pressure
- customthe resulting residue was chromatographed on silica gel (0.8:7.2:92 NH4OH/MeOH/CH2Cl2, eluant)
Sources & evidence
- ORD record
- ord-ee5cb3297666451da197b08bc6509bda
- Source dataset
- uspto-grants-2012_10
- Patent number
- US08278313B2
Reaction notes
Loading…