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HuagongsheHuagongshe Chemistry Print Report · For research reference only
HRID 2167116Generated: November 1, 2026

Chlorotrimethylsilane → HCID 89464476, compound

https://huagongshe.com/reaction/2167116

Reaction equation

Participants

RoleNameHCIDCharge
ReactantChlorotrimethylsilaneHCID 6397—
Reactant6-Methoxy-1,2,3,4-tetrahydronaphthalen-2-oneHCID 75582—
ReactantLithium diisopropylamideHCID 2724682—
SolventTetrahydrofuranHCID 8028—
ProductHCID 89464476HCID 89464476—

Reaction Steps

6-Methoxy-3,4-dihydronaphthalen-2(1H)-one (25 g) was treated with LDA (110 ml) in dry THF (500 ml) at −78° C. for 5 minutes. Then TMSCl (21.64 g) was added and after 30 minutes the cooling bath was removed. After 1 hour at room temperature the solvent was evaporated in vacuo and the residue was dissolved in heptane and filtered to eliminate the solid particulate. Finally the heptane was evaporated in vacuo.

Provenance & Evidence

DOI10.6084/m9.figshare.5104873.v1
Patent numberUS09044463B2
Source datasetuspto-grants-2015_06
ORD IDord-3b96575f14ef4886844140c509428804
Source noteuspto-grants-2015_06