Chlorotrimethylsilane → HCID 89464476, compound

HRID 2167116Notes

Reaction equation

HRID 2167116 reaction equation
[CH3:1][O:2][C:3]1[CH:4]=[C:5]2[C:10](=[CH:11][CH:12]=1)[CH2:9][C:8](=[O:13])[CH2:7][CH2:6]2.[Li+].CC([N-]C(C)C)C.[CH3:22][Si:23](Cl)([CH3:25])[CH3:24]>C1COCC1>[CH3:1][O:2][C:3]1[CH:4]=[C:5]2[C:10](=[CH:11][CH:12]=1)[CH2:9][CH:8]([O:13][Si:23]([CH3:25])([CH3:24])[CH3:22])[CH2:7][CH2:6]2

Participants

5

Reactant 3

HCID 6397ChlorotrimethylsilaneHCID 755826-Methoxy-1,2,3,4-tetrahydronaphthalen-2-oneHCID 2724682Lithium diisopropylamide

Product 1

HCID 89464476HCID 89464476, compound

Reagents, catalysts & solvents 1

HCID 8028TetrahydrofuranSolvent

Procedure

6-Methoxy-3,4-dihydronaphthalen-2(1H)-one (25 g) was treated with LDA (110 ml) in dry THF (500 ml) at −78° C. for 5 minutes. Then TMSCl (21.64 g) was added and after 30 minutes the cooling bath was removed. After 1 hour at room temperature the solvent was evaporated in vacuo and the residue was dissolved in heptane and filtered to eliminate the solid particulate. Finally the heptane was evaporated in vacuo.

Workup

  1. customwas removed
  2. customAfter 1 hour at room temperature the solvent was evaporated in vacuo
  3. dissolutionthe residue was dissolved in heptane
  4. filtrationfiltered
  5. customFinally the heptane was evaporated in vacuo

Sources & evidence

ORD record
ord-3b96575f14ef4886844140c509428804
Source dataset
uspto-grants-2015_06
Patent number
US09044463B2

Reaction notes

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