Trifluoroacetic acid → HCID 68416715, compound

HRID 2177603Notes

Reaction equation

HRID 2177603 reaction equation
[C:1]1([C:7]2[C:15]3[CH2:14][CH2:13][N:12](C(OC(C)(C)C)=O)[CH2:11][C:10]=3[N:9](COCC[Si](C)(C)C)[N:8]=2)[CH:6]=[CH:5][CH:4]=[CH:3][CH:2]=1.C(O)(C(F)(F)F)=O>C(Cl)Cl>[C:1]1([C:7]2[C:15]3[CH2:14][CH2:13][NH:12][CH2:11][C:10]=3[NH:9][N:8]=2)[CH:2]=[CH:3][CH:4]=[CH:5][CH:6]=1

Participants

4

Reactant 2

HCID 6422Trifluoroacetic acidHCID 131733006HCID 131733006, compound

Product 1

HCID 68416715HCID 68416715, compound

Reagents, catalysts & solvents 1

HCID 6344DichloromethaneSolvent

Procedure

tert-Butyl 3-phenyl-1-((2-(trimethylsilyl)ethoxy)methyl)-4,5-dihydro-1H-pyrazolo[3,4-c]pyridine-6(7H)-carboxylate (298 mg, 0.69 mmol) was dissolved in DCM (8 mL) with TFA (0.5 mL, 6.98 mmol) and was allowed to stir under N2 pressure at rt overnight. Solvent was removed and the residue partitioned between 2M Na2CO3 and DCM, then extracted with DCM three times. The combined organic layers were dried over Na2SO4 and concentrated. The resulting product was used as is in the next step.

Workup

  1. customSolvent was removed
  2. customthe residue partitioned between 2M Na2CO3 and DCM
  3. extractionextracted with DCM three times
  4. dry with materialThe combined organic layers were dried over Na2SO4
  5. concentrationconcentrated

Sources & evidence

ORD record
ord-afc23d97d52b4c19b826d236cd03932e
Source dataset
uspto-grants-2015_06
Patent number
US09066946B2

Reaction notes

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