Triethylsilane → HCID 178441794, 화합물

HRID 2179089노트

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HRID 2179089 반응식
[C:1]([C:5]1[N:6]=[C:7]([N:23]2[CH2:27][C:26]([F:29])([F:28])[C:25]([F:31])([F:30])[CH2:24]2)[C:8]2[N:13]=[N:12][N:11](CC3C=CC(OC)=CC=3)[C:9]=2[N:10]=1)([CH3:4])([CH3:3])[CH3:2].C([SiH](CC)CC)C>C(O)(C(F)(F)F)=O>[C:1]([C:5]1[N:6]=[C:7]([N:23]2[CH2:27][C:26]([F:28])([F:29])[C:25]([F:30])([F:31])[CH2:24]2)[C:8]2[N:13]=[N:12][NH:11][C:9]=2[N:10]=1)([CH3:4])([CH3:2])[CH3:3]

참가 물질

4

반응물 2

HCID 12052TriethylsilaneHCID 866833455-tert-Butyl-3-(4-methoxy-benzyl)-7-(3,3,4,4-tetrafluoro-pyrrolidin-1-yl)-3H-[1,2,3]triazolo[4,5-d]pyrimidine

생성물 1

HCID 178441794HCID 178441794, 화합물

시약·촉매·용매 1

HCID 6422Trifluoroacetic acid용매

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온도
70 °C

실험 절차

A mixture of 5-tert-Butyl-3-(4-methoxy-benzyl)-7-(3,3,4,4-tetrafluoro-pyrrolidin-1-yl)-3H-[1,2,3]triazolo[4,5-d]pyrimidine and triethylsilane in TFA was heated to 70° C. for 22 h and evaporated to dryness. The residue was used without further purification in the consecutive step.

후처리

  1. customevaporated to dryness
  2. customThe residue was used without further purification in the consecutive step

출처 및 근거

ORD 기록
ord-5c9dcd62e3af48dd8a0163ebfb078f13
출처 데이터셋
uspto-grants-2015_06
특허 번호
US09067943B2

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