Octane → HCID 178451154, compound

HRID 2272669Notes

Reaction equation

HRID 2272669 reaction equation
[C@H:1]1([C:10]([OH:12])=O)[CH2:6][CH2:5][C@@H:4]([C:7]([OH:9])=[O:8])[CH2:3][CH2:2]1.C(O[CH2:16][CH2:17][CH2:18][CH3:19])=O.[CH3:20]CCCCCCC.S(Cl)(Cl)=O.C[Zn]C>O.C([O-])(=O)C.[Pd+2].C([O-])(=O)C>[C:10]([C@@H:1]1[CH2:2][CH2:3][C@H:4]([C:7]([O:9][CH2:16][CH2:17][CH2:18][CH3:19])=[O:8])[CH2:5][CH2:6]1)(=[O:12])[CH3:20]

Participants

8

Conditions

Temperature
110 °C

Procedure

To a flask were added cis-cyclohexane-1,4-dicarboxylic acid (20 g, 116 mmol), n-butyl formate (581 ml, 5066 mmol), Dowex 50W×2 resin (87 grams), and octane (484 ml). The reaction mixture was heated to 110° C. overnight and then cooled and filtered. The resin was washed with 300 mL 1:1 hexane:EtOAc. The filtrate was concentrated and then taken up in toluene and re-concentrated. The resulting residue was dissolved in dichloromethane (119 ml) and then thionyl chloride (11.51 ml, 158 mmol) was added. The reaction mixture was heated to 38° C. overnight and then concentrated. The residue was taken up in DCM and re-concentrated (3×) to remove residual HCl. The resulting residue was dissolved in 1,4-dioxane (413 ml) and degassed with Ar for 30 minutes. Palladium (II) acetate (0.696 g, 3.10 mmol) was added and the mixture was degassed for an additional 30 minutes. Dimethyl zinc (2 M in toluene, 31.0 ml, 62.0 mmol) was added. The system was placed under argon through 3 cycles of evacuation and argon flushing then reacted at 38° C. overnight. The reaction mixture was cooled and diluted with water. The resulting mixture was filtered through a CELITE plug and then the solid was washed with EtOAc. The filtrate was concentrated and purified by column chromatography on silica gel (0-30% ethyl acetate/hexanes) to afford butyl cis-4-acetylcyclohexanecarboxylate. 1H NMR (500 MHz, DMSO-d6) δ 4.07 (t, J=6.6 Hz, 2H), 2.54-2.48 (m, 1H), 2.44-2.38 (m, 1H), 2.13 (s, 3H), 2.01-1.93 (m, 2H), 1.81-1.57 (m, 9H), 1.41-1.32 (m, 2H), 0.92 (t, J=7.5 Hz, 3H).

Workup

  1. temperaturecooled
  2. filtrationfiltered
  3. washThe resin was washed with 300 mL 1:1 hexane
  4. concentrationThe filtrate was concentrated
  5. concentrationre-concentrated
  6. dissolutionThe resulting residue was dissolved in dichloromethane (119 ml)
  7. temperatureThe reaction mixture was heated to 38° C. overnight
  8. concentrationconcentrated
  9. concentrationre-concentrated (3×)
  10. customto remove residual HCl
  11. dissolutionThe resulting residue was dissolved in 1,4-dioxane (413 ml)
  12. customdegassed with Ar for 30 minutes
  13. customthe mixture was degassed for an additional 30 minutes
  14. customthen reacted at 38° C. overnight
  15. temperatureThe reaction mixture was cooled
  16. filtrationThe resulting mixture was filtered through a CELITE plug
  17. washthe solid was washed with EtOAc
  18. concentrationThe filtrate was concentrated
  19. custompurified by column chromatography on silica gel (0-30% ethyl acetate/hexanes)

Sources & evidence

ORD record
ord-0aacb00eada541408d2534af522fc613
Source dataset
uspto-grants-2015_09
Patent number
US09120785B2

Reaction notes

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