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HuagongsheHuagongshe Chemistry Print Report · For research reference only
HRID 2394030Generated: October 29, 2026

Chlorotrimethylsilane → HCID 54681268, compound

https://huagongshe.com/reaction/2394030

Reaction equation

Participants

RoleNameHCIDCharge
ReactantChlorotrimethylsilaneHCID 6397—
Reactant2',3',4'-TrimethoxyacetophenoneHCID 83810—
ReactantLithium HexamethyldisilazideHCID 2733832—
Reactant[(Phenylmethyl)thio]propanedioic acidHCID 19596125—
ProductHCID 54681268HCID 54681268—

Reaction Steps

The title compound was prepared by Method A using 2',3', 4'-trimethoxyacetophenone (1.5 g, 7.13 mmol), lithium bis(trimethylsilyl)amide (1.43 g, 8.56 mmol), chlorotrimethylsilane (1.8 mL, 10.67 mmol) and diethyl ester of [(phenylmethyl)thio]propanedioic acid (1.00 g, 3.54 mmol).

Provenance & Evidence

DOI10.6084/m9.figshare.5104873.v1
Patent numberUS05808062
Source datasetuspto-grants-1998_09
ORD IDord-09af4d30171949cea15ddbbc30ca5a6c
Source noteuspto-grants-1998_09