Chlorotrimethylsilane → HCID 54681268, compound
Reaction equation
[CH3:1][O:2][C:3]1[C:8]([O:9][CH3:10])=[C:7]([O:11][CH3:12])[CH:6]=[CH:5][C:4]=1[C:13](=[O:15])[CH3:14].C[Si]([N-][Si](C)(C)C)(C)C.[Li+].Cl[Si](C)(C)C.[C:31]1([CH2:37][S:38][CH:39]([C:43](O)=[O:44])[C:40](O)=[O:41])[CH:36]=[CH:35][CH:34]=[CH:33][CH:32]=1>>[OH:44][C:43]1[CH:14]=[C:13]([C:4]2[CH:5]=[CH:6][C:7]([O:11][CH3:12])=[C:8]([O:9][CH3:10])[C:3]=2[O:2][CH3:1])[O:15][C:40](=[O:41])[C:39]=1[S:38][CH2:37][C:31]1[CH:36]=[CH:35][CH:34]=[CH:33][CH:32]=1Participants
5
Procedure
The title compound was prepared by Method A using 2',3', 4'-trimethoxyacetophenone (1.5 g, 7.13 mmol), lithium bis(trimethylsilyl)amide (1.43 g, 8.56 mmol), chlorotrimethylsilane (1.8 mL, 10.67 mmol) and diethyl ester of [(phenylmethyl)thio]propanedioic acid (1.00 g, 3.54 mmol).
Sources & evidence
- ORD record
- ord-09af4d30171949cea15ddbbc30ca5a6c
- Source dataset
- uspto-grants-1998_09
- Patent number
- US05808062
Reaction notes
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