Trifluoroacetic acid methylene chloride → HCID 178480555, compound
Reaction equation
[NH2:1][C:2]1[NH:6][N:5]=[C:4]2[CH2:7][N:8]([C@H:10]3[CH2:15][N:14]([CH3:16])[C@H:13]([C:17]4[CH:22]=[C:21]([F:23])[CH:20]=[CH:19][C:18]=4[F:24])[C@@H:12]([NH:25]C(=O)OC(C)(C)C)[CH2:11]3)[CH2:9][C:3]=12.[C:33]([OH:39])([C:35]([F:38])([F:37])[F:36])=[O:34].C(Cl)Cl>>[F:36][C:35]([F:38])([F:37])[C:33]([OH:39])=[O:34].[F:36][C:35]([F:38])([F:37])[C:33]([OH:39])=[O:34].[F:36][C:35]([F:38])([F:37])[C:33]([OH:39])=[O:34].[F:36][C:35]([F:38])([F:37])[C:33]([OH:39])=[O:34].[NH2:25][C@@H:12]1[C@@H:13]([C:17]2[CH:22]=[C:21]([F:23])[CH:20]=[CH:19][C:18]=2[F:24])[N:14]([CH3:16])[CH2:15][C@H:10]([N:8]2[CH2:9][C:3]3[C:4](=[N:5][NH:6][C:2]=3[NH2:1])[CH2:7]2)[CH2:11]1Participants
3
Procedure
The product from step B was treated with 1:1 TFA/CH2Cl2 for 1 h. The solvent was removed by evaporation under diminished pressure and residue dried under vacuum to give the title compound. LC-MS: 349.0 (M+1).
Workup
- customThe solvent was removed by evaporation under diminished pressure and residue
- customdried under vacuum
Sources & evidence
- ORD record
- ord-a310e6fe76c84968838d4678c7db4fe8
- Source dataset
- uspto-grants-2014_02
- Patent number
- US08653059B2
Reaction notes
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