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HuagongsheHuagongshe Chemistry Print Report · For research reference only
HRID 241570Generated: October 30, 2026

Trifluoroacetic acid methylene chloride → HCID 178480555, compound

https://huagongshe.com/reaction/241570

Reaction equation

Participants

RoleNameHCIDCharge
ReactantTrifluoroacetic acid methylene chlorideHCID 21863450—
ReactantHCID 178480556HCID 178480556—
ProductHCID 178480555HCID 178480555—

Reaction Steps

The product from step B was treated with 1:1 TFA/CH2Cl2 for 1 h. The solvent was removed by evaporation under diminished pressure and residue dried under vacuum to give the title compound. LC-MS: 349.0 (M+1).

Provenance & Evidence

DOI10.6084/m9.figshare.5104873.v1
Patent numberUS08653059B2
Source datasetuspto-grants-2014_02
ORD IDord-a310e6fe76c84968838d4678c7db4fe8
Source noteuspto-grants-2014_02