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HuagongsheHuagongshe Chemistry Print Report · For research reference only
HRID 341723Generated: October 26, 2026

Water → Trimethylsilylmethyl methacrylate tertiarybutyl methacrylate

https://huagongshe.com/reaction/341723

Reaction equation

Participants

RoleNameHCIDCharge
ReactantWaterHCID 962—
ReactantAzobisisobutyronitrileHCID 6547—
Reactanttert-Butyl methacrylateHCID 11448—
ReactantMethacryloxymethyltrimethylsilaneHCID 2760855—
SolventMethanolHCID 887—
SolventTolueneHCID 1140—
ProductTrimethylsilylmethyl methacrylate tertiarybutyl methacrylateHCID 8675351180%

Reaction Steps

Trimethylsilylmethyl methacrylate (TMSMMA) and tertiarybutyl methacrylate (TBMA) were mixed at a ratio of 1:1 so as to prepare a toluene solution having a monomer concentration of 5.0 mol/liter. Next, 2 mol %, on the basis of the monomer, of AIBN was added to the mixture, and the mixture was retained in an oil bath at 80° C. for 15 minutes. Next, the mixture was left standing to cool to room temperature. After the mixture was diluted with toluene, it was dropped into large quantities of a mixed solvent of water and methanol having a mixing ratio of 1:20, and the resulting precipitate was filtered and dried to obtain a base polymer of a resist material. There was thus obtained a trimethylsilylmethyl methacrylate/tertiarybutyl methacrylate copolymer represented by the following formula, ##STR12## wherein each of m and n is a positive integer. In this example, the copolymer described above could be obtained at a yield of 80%, the molecular weight was 38,000 and the dispersion was 1.70.

Provenance & Evidence

DOI10.6084/m9.figshare.5104873.v1
Patent numberUS05856071
Source datasetuspto-grants-1999_01
ORD IDord-77ca23db37004b9aa1a47099824914fa
Source noteuspto-grants-1999_01